Development of a combinatorial plasma process analyzer for advanced R&D of next generation nanodevice fabrication

Kosuke Takenaka, Ken Cho, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hon

研究成果: 著書/レポートタイプへの貢献会議での発言

抜粋

To develop a combinatorial plasma process analyzer in which the plasma distributions are finely controlled, we have carried out plasma-fluid simulations. The simulations show the feasibility of using low inductance antenna (LIA) modules to produce density-inclination plasmas. Numerically predicted plasma density profiles are generally in excellent agreement with experiments. A considerable inclination in plasma density was obtained using localized power deposition profiles. The results show that a variety of process results can be efficiently analyzed via the inclination distribution along the substrate for the process parameters.

元の言語英語
ホスト出版物のタイトルCharacterization and Control of Interfaces for High Quality Advanced Materials III - Proc. 3rd Int. Conf. on Characterization and Control of Interfaces for High Quality Advanced Materials,ICCCI2009
ページ279-284
ページ数6
219
出版物ステータス出版済み - 2010
イベント3rd International Conference on Characterization and Control of Interfaces for High Quality Advanced Materials, ICCCI2009 - Kurashiki, 日本
継続期間: 9 6 20099 9 2009

出版物シリーズ

名前Ceramic Transactions
219
ISSN(印刷物)10421122

その他

その他3rd International Conference on Characterization and Control of Interfaces for High Quality Advanced Materials, ICCCI2009
日本
Kurashiki
期間9/6/099/9/09

    フィンガープリント

All Science Journal Classification (ASJC) codes

  • Ceramics and Composites
  • Materials Chemistry

これを引用

Takenaka, K., Cho, K., Setsuhara, Y., Shiratani, M., Sekine, M., & Hon, M. (2010). Development of a combinatorial plasma process analyzer for advanced R&D of next generation nanodevice fabrication. : Characterization and Control of Interfaces for High Quality Advanced Materials III - Proc. 3rd Int. Conf. on Characterization and Control of Interfaces for High Quality Advanced Materials,ICCCI2009 (巻 219, pp. 279-284). (Ceramic Transactions; 巻数 219).