Development of basic-type CMP/P-CVM fusion processing system (Type A) and its fundamental characteristics

Kousuke Shiozawa, Yasuhisa Sano, Syuhei Kurokawa, Tadakazu Miyashita, Haruo Sumizawa, Toshiro Doi, Hideo Aida, Koki Oyama, Kazuto Yamauchi

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

1 被引用数 (Scopus)

抄録

We propose a chemical mechanical polishing (CMP)/Plasma Chemical Vaporization Machining (P-CVM) fusion processing and developed basic type CMP/P-CVM fusion processing, which consists of mechanical polish part, P-CVM part, and sample holder moving between them. As a result of basic experiments using silicon carbide as a sample, it is found that Peak to valley of the surface profile can be reduced from 1500 nm to 200-300 nm by 40-times repetition of the mechanical polishing followed by P-CVM and the decrease rate of the height of the mesa structures by a CMP/P-CVM fusion processing is approximately 3.5 times larger than that of the mechanical polish.

本文言語英語
ホスト出版物のタイトルICPT 2014 - Proceedings of International Conference on Planarization/CMP Technology 2014
出版社Institute of Electrical and Electronics Engineers Inc.
ページ275-278
ページ数4
ISBN(電子版)9781479955565
DOI
出版ステータス出版済み - 1 20 2015
イベント11th International Conference on Planarization/CMP Technology, ICPT 2014 - Kobe, 日本
継続期間: 11 19 201411 21 2014

出版物シリーズ

名前ICPT 2014 - Proceedings of International Conference on Planarization/CMP Technology 2014

その他

その他11th International Conference on Planarization/CMP Technology, ICPT 2014
Country日本
CityKobe
Period11/19/1411/21/14

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Hardware and Architecture

フィンガープリント 「Development of basic-type CMP/P-CVM fusion processing system (Type A) and its fundamental characteristics」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル