Development of EUV light source by CO2 laser-produced plasma with nano-structured SnO2 targets

H. Tanaka, K. Akinaga, A. Takahashi, T. Okada

研究成果: ジャーナルへの寄稿Conference article

3 引用 (Scopus)

抄録

EUV lithography is scheduled on the international technology roadmap for semiconductors (ITRS). In order to introduce the EUV light source into the production lines, EUV light sources having an average power of more than 100 W at 13.5 nm are needed. Such EUV light sources have been under development by using the laser-produced plasma (LPP) or the discharge-produced plasma (DPP). In the case of Sn LPP, the efficiency is several times higher than that of Xe LPP, but the problem of debris generation that limits the lifetime of the optics in the lithographic system is serious. The mechanism of debris generation is considered to be splashes of a melted surface by rapid heating of the sub-surface within a depth of about 100 nm. So we have suspected that the nano-particles with a diameter of less than 100 nm produce no debris, because the sub-surface can not be produced within such a small particle. In this study, we developed nano-structured SnO2 targets and investigated the emission characteristics of EUV light from CO2 laser produced plasma with those targets.

元の言語英語
記事番号49
ページ(範囲)313-318
ページ数6
ジャーナルProceedings of SPIE - The International Society for Optical Engineering
5662
DOI
出版物ステータス出版済み - 12 1 2004
イベントFifth International Symposium on Laser Precision Microfabrication - Nara, 日本
継続期間: 5 11 20045 14 2004

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Laser-produced Plasma
Laser produced plasmas
CO2 Laser
laser plasmas
Light sources
light sources
debris
Debris
Target
EUV Lithography
Extreme ultraviolet lithography
Production Line
plasma jets
Nanoparticles
Heating
Optics
Semiconductors
Lifetime
lithography
Plasma

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

これを引用

Development of EUV light source by CO2 laser-produced plasma with nano-structured SnO2 targets. / Tanaka, H.; Akinaga, K.; Takahashi, A.; Okada, T.

:: Proceedings of SPIE - The International Society for Optical Engineering, 巻 5662, 49, 01.12.2004, p. 313-318.

研究成果: ジャーナルへの寄稿Conference article

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