Development of high-resolution and light-weight x-ray optics with deformed silicon wafers

Yuichiro Ezoe, Takayuki Shirata, Takaya Ohashi, Manabu Ishida, Kazuhisa Mitsuda, Kozo Fujiwara, Kohei Morishita, Kazuo Nakajima

研究成果: 書籍/レポート タイプへの寄稿会議への寄与

5 被引用数 (Scopus)

抄録

We report on our development of hot plastic deformation of silicon wafer for high-resolution and light-weight X-ray optics. The highly polished silicon wafer with an excellent flat surface is a promising candidate for the next generation space X-ray telescopes. Deformation accuracy and stability, especially if elastic deformation is used, are issues. The hot plastic deformation of the silicon wafer allows us 3-dimensional shaping without spring back after the deformation. As a first step of R & D, we conducted the hot plastic deformation of 4-inch silicon (111) wafers with a thickness of 300 μm by using hemispherical dies with a curvature radius of 1000 mm. The deformed wafer kept good surface quality but showed a slightly large curvature of 1030 mm. We measured the X-ray reflectivity of the deformed wafer at Al K α 1.49 keV. For the first time, we detected the total X-ray reflection on the deformed wafer. Estimated rms surface roughness was 0-1 nm and no significant degradation from the bare silicon wafers was seen.

本文言語英語
ホスト出版物のタイトルEUV and X-Ray Optics
ホスト出版物のサブタイトルSynergy between Laboratory and Space
7360
DOI
出版ステータス出版済み - 9月 14 2009
外部発表はい
イベントEUV and X-Ray Optics: Synergy between Laboratory and Space - Prague, チェコ共和国
継続期間: 4月 20 20094月 22 2009

その他

その他EUV and X-Ray Optics: Synergy between Laboratory and Space
国/地域チェコ共和国
CityPrague
Period4/20/094/22/09

!!!All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • コンピュータ サイエンスの応用
  • 応用数学
  • 電子工学および電気工学

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