抄録
We report on our development of hot plastic deformation of silicon wafer for high-resolution and light-weight X-ray optics. The highly polished silicon wafer with an excellent flat surface is a promising candidate for the next generation space X-ray telescopes. Deformation accuracy and stability, especially if elastic deformation is used, are issues. The hot plastic deformation of the silicon wafer allows us 3-dimensional shaping without spring back after the deformation. As a first step of R & D, we conducted the hot plastic deformation of 4-inch silicon (111) wafers with a thickness of 300 μm by using hemispherical dies with a curvature radius of 1000 mm. The deformed wafer kept good surface quality but showed a slightly large curvature of 1030 mm. We measured the X-ray reflectivity of the deformed wafer at Al K α 1.49 keV. For the first time, we detected the total X-ray reflection on the deformed wafer. Estimated rms surface roughness was 0-1 nm and no significant degradation from the bare silicon wafers was seen.
本文言語 | 英語 |
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ホスト出版物のタイトル | EUV and X-Ray Optics |
ホスト出版物のサブタイトル | Synergy between Laboratory and Space |
巻 | 7360 |
DOI | |
出版ステータス | 出版済み - 9 14 2009 |
外部発表 | はい |
イベント | EUV and X-Ray Optics: Synergy between Laboratory and Space - Prague, チェコ共和国 継続期間: 4 20 2009 → 4 22 2009 |
その他
その他 | EUV and X-Ray Optics: Synergy between Laboratory and Space |
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Country | チェコ共和国 |
City | Prague |
Period | 4/20/09 → 4/22/09 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering