A polyhedral oligomeric silsesquioxane (POSS)-holding initiator for nitroxide-mediated radical polymerization was designed and used to prepare organic-inorganic hybrid polymers (PS-POSS), which were polystyrene (PS) attached with POSS at one end. Differential scanning calorimetric analysis showed that the glass transition temperature of PS-POSS (Mn=2500, Mw/Mn=1.11) was slightly higher than that of PS (M n=2100, Mw/Mn=1.13) without the POSS moiety. PS-POSS/PS blend thin films were spin-coated from their toluene solution onto cleaned silicon wafers. Atomic force microscopic observation suggested that PS-POSS was considerably dispersed in PS matrix. Furthermore, the incorporation of PS-POSS into PS thin films served to improve the stability of the thin film against dewetting.
|ホスト出版物のタイトル||54th SPSJ Symposium on Macromolecules - Polymer Preprints, Japan|
|出版ステータス||出版済み - 2005|
|イベント||54th SPSJ Symposium on Macromolecules - Yamagata, 日本|
継続期間: 9 20 2005 → 9 22 2005
|その他||54th SPSJ Symposium on Macromolecules|
|Period||9/20/05 → 9/22/05|
All Science Journal Classification (ASJC) codes