Diffusion dominated process for the crystal growth of a binary alloy

Wen Rui Hu, Akira Hirata, Shin Ichi Nishizawa

研究成果: Contribution to journalArticle査読

抄録

The pure diffusion process has been often used to study the crystal growth of a binary alloy in the microgravity environment. In the present paper, a geometric parameter, the ratio of the maximum deviation distance of curved solidification and melting interfaces from the plane to the radius of the crystal rod, was adopted as a small parameter, and the analytical solution was obtained based on the perturbation theory. The radial segregation of a diffusion dominated process was obtained for cases of arbitrary Peclet number in a region of finite extension with both a curved solidification interface and a curved melting interface. Two types of boundary conditions at the melting interface were analyzed. Some special cases such as infinite extension in the longitudinal direction and special range of Peclet number were reduced from the general solution and discussed in detail.

本文言語英語
ページ(範囲)380-392
ページ数13
ジャーナルJournal of Crystal Growth
169
2
DOI
出版ステータス出版済み - 11 1996
外部発表はい

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

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