Diffusional behavior of tritium in V-4Cr-4Ti alloy

K. Hashizume, J. Masuda, T. Otsuka, T. Tanabe, Y. Hatano, Y. Nakamura, T. Nagasaka, T. Muroga

    研究成果: ジャーナルへの寄稿学術誌査読

    16 被引用数 (Scopus)


    Tritium diffusion behavior in a V-4Cr-4Ti (NIFS-Heat-2) alloy has been examined with a tritium tracer technique. Firstly, a small amount of tritium (T) was implanted into the specimen surface, and then the specimen was diffusion-annealed at temperatures ranging from 373 K to 573 K. The diffusion depth profile of T in the specimen was measured with a tritium imaging plate (IP) technique to determine the diffusion coefficient. The obtained diffusion coefficient of tritium in V-4Cr-4Ti is expressed asDt (cm2 / s) = (7.5 ± 0.2) × 10- 4 exp (- 0.13 (eV) / kT),which is lower than that in pure vanadium, and is comparable with literature values of protium in a V-4Ti alloy taking the isotope mass effect into consideration.

    ジャーナルJournal of Nuclear Materials
    367-370 A
    SPEC. ISS.
    出版ステータス出版済み - 8月 1 2007

    !!!All Science Journal Classification (ASJC) codes

    • 核物理学および高エネルギー物理学
    • 材料科学(全般)
    • 原子力エネルギーおよび原子力工学


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