Discussion on hole traps of amorphous films of N, N ′-di(1-naphthyl)- N, N ′-diphenyl-(1,1′-biphenyl)-4,4′-diamine (α- NPD) deposited at different substrate temperatures

研究成果: ジャーナルへの寄稿学術誌査読

3 被引用数 (Scopus)

抄録

The hole current in amorphous films of N,N′-di(1-naphthyl)-N,N′-diphenyl-(1,1′-biphenyl)-4,4′-diamine (α-NPD) strongly depends on substrate temperature during vacuum deposition (Tsub) and is the highest at a Tsub value of around 275 K. However, the reason for this enhancement of hole current at this Tsub is not clearly understood. In this study, we performed thermally stimulated current (TSC) measurements, which is a versatile method used to obtain information about carrier traps, on α-NPD films. The TSC results revealed that hole traps were uniformly distributed throughout the films and that hole traps were the shallowest for films fabricated at a Tsub value of around 275 K. Thus, the shallowest hole traps at this Tsub are believed to be one reason for the highest hole current for α-NPD films. This is the demonstration of how Tsub affects carrier traps, contributing to a better understanding of the underlying physics in organic amorphous films.

本文言語英語
論文番号173301
ジャーナルApplied Physics Letters
114
17
DOI
出版ステータス出版済み - 4月 29 2019

!!!All Science Journal Classification (ASJC) codes

  • 物理学および天文学(その他)

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