Dominant ion species in VHF SiH4/H2 plasma

Yasuhiro Yamauchi, Tomoyoshi Baba, Tsukasa Yamane, Yoshiaki Takeuchi, Hiromu Takatsuka, Hiroshi Muta, Kiichiro Uchino, Yoshinobu Kawai

研究成果: ジャーナルへの寄稿Conference article

2 引用 (Scopus)

抜粋

Dominant ion species in VHF SiH4/H2 plasma (frequency 60 MHz) were estimated from the sheath potential and the electron temperature measured with the Langmuir probe. As the concentration of SiH4/H 2 was increased, the transition of dominant ion species from H + to SiH3+ was observed. When the discharge gap was shorter than 10 mm, measured sheath potentials were anomalously low compared with the calculated ones.

元の言語英語
ページ(範囲)549-552
ページ数4
ジャーナルPhysica Status Solidi (C) Current Topics in Solid State Physics
7
発行部数3-4
DOI
出版物ステータス出版済み - 5 27 2010
イベント23rd International Conference on Amorphous and Nanocrystalline Semiconductors, ICANS23 - Utrecht, オランダ
継続期間: 8 23 20098 28 2009

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics

フィンガープリント Dominant ion species in VHF SiH<sub>4</sub>/H<sub>2</sub> plasma' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

  • これを引用

    Yamauchi, Y., Baba, T., Yamane, T., Takeuchi, Y., Takatsuka, H., Muta, H., Uchino, K., & Kawai, Y. (2010). Dominant ion species in VHF SiH4/H2 plasma. Physica Status Solidi (C) Current Topics in Solid State Physics, 7(3-4), 549-552. https://doi.org/10.1002/pssc.200982661