Dynamical diffraction effect on HOLZ-pattern geometry in Si-Ge alloys and determination of local lattice parameter

Y. Tomokiyo, S. Matsumura, T. Okuyama, T. Yasunaga, N. Kuwano, K. Oki

研究成果: Contribution to journalArticle査読

18 被引用数 (Scopus)

抄録

Higher-order Laue zone (HOLZ) patterns are observed in convergent-beam electron diffraction (CBED) patterns of Si-Ge alloys and the dynamical effect on HOLZ lines is discussed in relation to the kinematical approximation to simulate the HOLZ lines. Double lines often appear from one HOLZ reflection due to the excitation of the first and second branches of the zeroth-layer dispersion surface. The magnitude of the systematic line shift from the line positions predicted by the kinematical simulation changes sensitively with specimen thickness and alloy composition depending on which branch is dominantly excited. The kinematical simulation is applicable to accurate determination of lattice parameters with a proper correction δE: a difference between the effective electron energy and the actual microscope operating voltage. Usefulness of the kinematical simulation is demonstrated in the investigation of the segregation in a Si-Ge alloy.

本文言語英語
ページ(範囲)276-285
ページ数10
ジャーナルUltramicroscopy
54
2-4
DOI
出版ステータス出版済み - 6 1994

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Instrumentation

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