Dynamics of debris from laser-irradiated Sn droplet for EUV lithography light source

K. Okazaki, Daisuke Nakamura, T. Akiyama, K. Toya, Akihiko Takahashi, T. Okada

研究成果: ジャーナルへの寄稿Conference article

4 引用 (Scopus)

抄録

In the development of extreme ultraviolet (EUV) light source at 13.5 nm for EUV lithography system by laser-produced plasma (LPP), a Tin (Sn) micro-droplet target is considered as a one of the promising targets for debris mitigation. Inaddition, double pulse irradiation scheme is regarded to be effective in order to improve the conversion efficiency to EUV light in the use of the droplet target. In our study, the dynamics of debris from the Sn droplet target irradiated bydouble pulses was investigated in order to establish the guideline for the optimum design of the mitigation system. The kinetic behaviors of the Sn atoms and of the dense particles from Sn droplet target irradiated by double pulses from the Nd:YAG laser and the CO2 laser were investigated by the laser-induced fluorescence imaging method and a high-speed imaging, respectively. After the pre-pulse irradiation of the Nd:YAG laser, the Sn atoms were ejected in all direction from the target with a speed of as fast as 20 km/s and the dense particle cloud expanded by a reaction force due to the plasma expansion with a speed of approximately 500 m/s. The expanding target was subsequently irradiated by the mainpulse of CO2 laser and the dense cloud was almost disappeared by main-pulse irradiation.

元の言語英語
記事番号72010T
ジャーナルProceedings of SPIE - The International Society for Optical Engineering
7201
DOI
出版物ステータス出版済み - 5 25 2009
イベントLaser Applications in Microelectronic and Optoelectronic Manufacturing VII - San Jose, CA, 米国
継続期間: 1 26 20091 29 2009

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Extreme ultraviolet lithography
Extreme Ultraviolet Lithography
debris
Debris
Droplet
Light sources
light sources
lithography
Laser
Target
Lasers
lasers
Irradiation
pulses
CO2 Laser
Laser pulses
Nd:YAG Laser
Ultraviolet
ultraviolet radiation
Laser produced plasmas

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

これを引用

Dynamics of debris from laser-irradiated Sn droplet for EUV lithography light source. / Okazaki, K.; Nakamura, Daisuke; Akiyama, T.; Toya, K.; Takahashi, Akihiko; Okada, T.

:: Proceedings of SPIE - The International Society for Optical Engineering, 巻 7201, 72010T, 25.05.2009.

研究成果: ジャーナルへの寄稿Conference article

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abstract = "In the development of extreme ultraviolet (EUV) light source at 13.5 nm for EUV lithography system by laser-produced plasma (LPP), a Tin (Sn) micro-droplet target is considered as a one of the promising targets for debris mitigation. Inaddition, double pulse irradiation scheme is regarded to be effective in order to improve the conversion efficiency to EUV light in the use of the droplet target. In our study, the dynamics of debris from the Sn droplet target irradiated bydouble pulses was investigated in order to establish the guideline for the optimum design of the mitigation system. The kinetic behaviors of the Sn atoms and of the dense particles from Sn droplet target irradiated by double pulses from the Nd:YAG laser and the CO2 laser were investigated by the laser-induced fluorescence imaging method and a high-speed imaging, respectively. After the pre-pulse irradiation of the Nd:YAG laser, the Sn atoms were ejected in all direction from the target with a speed of as fast as 20 km/s and the dense particle cloud expanded by a reaction force due to the plasma expansion with a speed of approximately 500 m/s. The expanding target was subsequently irradiated by the mainpulse of CO2 laser and the dense cloud was almost disappeared by main-pulse irradiation.",
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AU - Nakamura, Daisuke

AU - Akiyama, T.

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AU - Takahashi, Akihiko

AU - Okada, T.

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