Effect of bias application on c-BN synthesis by induction thermal plasmas under atmospheric pressure

Takayuki Watanabe, Ryoichi Sataka, Kenji Yamamoto

研究成果: Contribution to journalArticle査読

5 被引用数 (Scopus)

抄録

Synthesis of c-BN was enhanced with DC bias application on the substrate in atmospheric pressure induction plasmas in this study. Previous c-BN synthesis has been performed under reduced pressure using explosive and hazardous gases. For industrial application such as coating on cutting tools, improvement of c-BN synthesis method has been strongly required. Therefore, the purpose of this paper is to investigate the mechanism of enhanced c-BN synthesis with bias application using safe starting material, h-BN and boron powder, under atmospheric pressure. The bias application leads to the optimum B/N ratio as well as the reduction of oxygen impurity in the deposits, resulting in the successful c-BN synthesis under atmospheric pressure. Important process for c-BN formation is attributed to the formation of high density of activated species such as N+, and the quenching process on the substrate. We conclude that bias application is important to increase activated species.

本文言語英語
ページ(範囲)4462-4467
ページ数6
ジャーナルThin Solid Films
516
13
DOI
出版ステータス出版済み - 5 1 2008
外部発表はい

All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • 表面および界面
  • 表面、皮膜および薄膜
  • 金属および合金
  • 材料化学

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