Effect of end group-substrate interaction on aggregation structure of polystyrene ultrathin films

Atsushi Takahara, Tisato Kajiyama

研究成果: Contribution to journalArticle査読

11 被引用数 (Scopus)

抄録

The aggregation structure of proton-, monocarboxyl-, and dicarboxyl terminated polystyrene (PS) ultrathin films spin-coated onto different substrate surfaces was investigated on the basis of atomic force microscopy (AFM). In the case of the monocarboxyl- and dicarboxyl-terminated PS ultrathin films spin-coated onto Si-wafer, the dewetting occurred after annealing above their bulk glass transition temperatures. In contrast, those (monocarboxyl and dicarboxyl-terminated PS ultrathin films spin-coated) onto aminosilane-treated Si-wafer did not dewet even after annealing above the bulk Tg, owing to the specific interaction between -COOH and -NH2 groups of aminosilane onto the Si-wafer.

本文言語英語
ページ(範囲)89-95
ページ数7
ジャーナルPolymer Journal
31
1
DOI
出版ステータス出版済み - 1999

All Science Journal Classification (ASJC) codes

  • Polymers and Plastics
  • Materials Chemistry

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