Effect of excitation frequency on the spatial distributions of a surface wave plasma

Hiroshi Muta, Satoshi Nishida, Shizuma Kuribayashi, Naoki Yoshikawa, Ryota Komatsu, Kiichiro Uchino, Yoshinobu Kawai

研究成果: ジャーナルへの寄稿記事

3 引用 (Scopus)

抄録

Using different frequencies of 2.45 GHz and 915 MHz, the effect of excitation frequency on the spatial distributions of a surface wave plasma for 450mm wafer processing was experimentally investigated at a medium pressure of 1 Torr. As a result, it was found that the mode number of standing waves which the surface waves form in the radial direction has great influence on the radial distribution of plasma density. Consequently, the plasma uniformity in the downstream region at 915 MHz was better than that at 2.45 GHz. On the other hand, the electron temperature was roughly constant and below 1.5 eV except in the vicinity of the quartz window at both frequencies.

元の言語英語
記事番号01AB07
ジャーナルJapanese Journal of Applied Physics
50
発行部数1 PART 2
DOI
出版物ステータス出版済み - 1 1 2011

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Surface waves
Spatial distribution
surface waves
spatial distribution
Plasmas
Plasma density
Electron temperature
excitation
Quartz
standing waves
radial distribution
plasma density
quartz
Processing
wafers
electron energy

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

これを引用

Muta, H., Nishida, S., Kuribayashi, S., Yoshikawa, N., Komatsu, R., Uchino, K., & Kawai, Y. (2011). Effect of excitation frequency on the spatial distributions of a surface wave plasma. Japanese Journal of Applied Physics, 50(1 PART 2), [01AB07]. https://doi.org/10.1143/JJAP.50.01AB07

Effect of excitation frequency on the spatial distributions of a surface wave plasma. / Muta, Hiroshi; Nishida, Satoshi; Kuribayashi, Shizuma; Yoshikawa, Naoki; Komatsu, Ryota; Uchino, Kiichiro; Kawai, Yoshinobu.

:: Japanese Journal of Applied Physics, 巻 50, 番号 1 PART 2, 01AB07, 01.01.2011.

研究成果: ジャーナルへの寄稿記事

Muta, H, Nishida, S, Kuribayashi, S, Yoshikawa, N, Komatsu, R, Uchino, K & Kawai, Y 2011, 'Effect of excitation frequency on the spatial distributions of a surface wave plasma', Japanese Journal of Applied Physics, 巻. 50, 番号 1 PART 2, 01AB07. https://doi.org/10.1143/JJAP.50.01AB07
Muta, Hiroshi ; Nishida, Satoshi ; Kuribayashi, Shizuma ; Yoshikawa, Naoki ; Komatsu, Ryota ; Uchino, Kiichiro ; Kawai, Yoshinobu. / Effect of excitation frequency on the spatial distributions of a surface wave plasma. :: Japanese Journal of Applied Physics. 2011 ; 巻 50, 番号 1 PART 2.
@article{08d5c6a242ce4394aa43340688932b93,
title = "Effect of excitation frequency on the spatial distributions of a surface wave plasma",
abstract = "Using different frequencies of 2.45 GHz and 915 MHz, the effect of excitation frequency on the spatial distributions of a surface wave plasma for 450mm wafer processing was experimentally investigated at a medium pressure of 1 Torr. As a result, it was found that the mode number of standing waves which the surface waves form in the radial direction has great influence on the radial distribution of plasma density. Consequently, the plasma uniformity in the downstream region at 915 MHz was better than that at 2.45 GHz. On the other hand, the electron temperature was roughly constant and below 1.5 eV except in the vicinity of the quartz window at both frequencies.",
author = "Hiroshi Muta and Satoshi Nishida and Shizuma Kuribayashi and Naoki Yoshikawa and Ryota Komatsu and Kiichiro Uchino and Yoshinobu Kawai",
year = "2011",
month = "1",
day = "1",
doi = "10.1143/JJAP.50.01AB07",
language = "English",
volume = "50",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
issn = "0021-4922",
publisher = "Institute of Physics",
number = "1 PART 2",

}

TY - JOUR

T1 - Effect of excitation frequency on the spatial distributions of a surface wave plasma

AU - Muta, Hiroshi

AU - Nishida, Satoshi

AU - Kuribayashi, Shizuma

AU - Yoshikawa, Naoki

AU - Komatsu, Ryota

AU - Uchino, Kiichiro

AU - Kawai, Yoshinobu

PY - 2011/1/1

Y1 - 2011/1/1

N2 - Using different frequencies of 2.45 GHz and 915 MHz, the effect of excitation frequency on the spatial distributions of a surface wave plasma for 450mm wafer processing was experimentally investigated at a medium pressure of 1 Torr. As a result, it was found that the mode number of standing waves which the surface waves form in the radial direction has great influence on the radial distribution of plasma density. Consequently, the plasma uniformity in the downstream region at 915 MHz was better than that at 2.45 GHz. On the other hand, the electron temperature was roughly constant and below 1.5 eV except in the vicinity of the quartz window at both frequencies.

AB - Using different frequencies of 2.45 GHz and 915 MHz, the effect of excitation frequency on the spatial distributions of a surface wave plasma for 450mm wafer processing was experimentally investigated at a medium pressure of 1 Torr. As a result, it was found that the mode number of standing waves which the surface waves form in the radial direction has great influence on the radial distribution of plasma density. Consequently, the plasma uniformity in the downstream region at 915 MHz was better than that at 2.45 GHz. On the other hand, the electron temperature was roughly constant and below 1.5 eV except in the vicinity of the quartz window at both frequencies.

UR - http://www.scopus.com/inward/record.url?scp=79955151877&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79955151877&partnerID=8YFLogxK

U2 - 10.1143/JJAP.50.01AB07

DO - 10.1143/JJAP.50.01AB07

M3 - Article

AN - SCOPUS:79955151877

VL - 50

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 1 PART 2

M1 - 01AB07

ER -