Effect of high repetition pulsed laser annealing on optical properties of phosphorus ion-implanted ZnO nanorods

Tetsuya Shimogaki, Taihei Ofuji, Norihiro Tetsuyama, Kota Okazaki, Mitsuhiro Higashihata, Daisuke Nakamura, Hiroshi Ikenoue, Tanemasa Asano, Tatsuo Okada

研究成果: 書籍/レポート タイプへの寄稿会議への寄与

抄録

We report on the effect of high repetition pulsed laser annealing with a KrF excimer laser on the optical properties of phosphorus ion-implanted ZnO nanorods. The recovery levels of phosphorus ion-implanted ZnO nanorods have been measured by photoluminescence spectra and cathode luminescence (CL) images. After ion implantation on the surface of ZnO nanorods, CL was disappeared over 400 nm below the surface due to the damage caused by ion implantation. When the annealing was performed at a low repetition, CL was recovered only shallow area below the surface. The depth of the annealed area was increased with the repetition rate of the annealing laser. By optimizing the annealing conditions such as the repetition rate, the irradiation fluence and so on, we have succeeded to anneal the whole damaged area over 400 nm in depth and to observe CL. Thus, the effectiveness of high repetition pulsed laser annealing on phosphorus ion-implanted ZnO nanorods was demonstrated.

本文言語英語
ホスト出版物のタイトルMaterials Science and Chemical Engineering
ページ383-386
ページ数4
DOI
出版ステータス出版済み - 7月 8 2013
イベント2013 International Conference on Materials Science and Chemical Engineering, MSCE 2013 - , シンガポール
継続期間: 2月 20 20132月 21 2013

出版物シリーズ

名前Advanced Materials Research
699
ISSN(印刷版)1022-6680

その他

その他2013 International Conference on Materials Science and Chemical Engineering, MSCE 2013
国/地域シンガポール
Period2/20/132/21/13

!!!All Science Journal Classification (ASJC) codes

  • 工学(全般)

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