Effect of Ni layer thickness on Cu-based {100}〈001〉 textured substrate for coated conductor

Naoji Kashima, Shuichi Kubota, Kunihiro Shima, Toshiya Doi, Shigeo Nagaya, Masayoshi Inoue, Takanobu Kiss

研究成果: ジャーナルへの寄稿学術誌査読

5 被引用数 (Scopus)

抄録

We prepared substrates with the structure electroplated Ni/textured Cu/stainless steel (SS) and clarified the effect of the electroplated Ni layer thickness on the substrate performance by investigating the dependences of the degree of crystal orientation and the surface roughness on the Ni layer thickness. It was confirmed that the orientation of the Ni layer did not significantly change up to a thickness of 10μm; however, the surface roughness of the Ni layer decreased when the layer thickness exceeded 3μm. From these results, in order to achieve a high critical current density (J c) on a Cu substrate, it is suggested that the preferred maximum thickness of the Ni layer on the textured Cu should be approximately 3 μm. In addition, the possibility of broad availability for the coating process was investigated by estimating the Cu concentration on the surface of a 3μm-thick Ni layer.

本文言語英語
論文番号063101
ジャーナルJapanese journal of applied physics
50
6 PART 1
DOI
出版ステータス出版済み - 6月 1 2011

!!!All Science Journal Classification (ASJC) codes

  • 工学(全般)
  • 物理学および天文学(全般)

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