Effect of oxygen plasma exposure of porous spin-on-glass films

E. Kondoh, T. Asano, A. Nakashima, M. Komatu

研究成果: Contribution to journalArticle査読

79 被引用数 (Scopus)

抄録

The plasma oxidation of hydrogen methyl siloxane based porous spin on glass (SOG) films. The Fourier transform infrared (FTIR) analyses show that the intensities of hydrophobic groups decrease with plasma exposure time. An increase in the OH intensity and decrease in the film thickness were also observed. From ellipsometric analyses, it is determined that the loss of hydrophobic groups causes spontaneous film shrinkage. When the substrate was biased during O2 plasma exposure, less film oxidation, shrinkage and moisture uptake were observed. The mechanism that causes the suppressed oxidation was discussed from the point of view of competition between oxidation and sputtering.

本文言語英語
ページ(範囲)1276-1280
ページ数5
ジャーナルJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
18
3
DOI
出版ステータス出版済み - 5 2000
外部発表はい

All Science Journal Classification (ASJC) codes

  • 凝縮系物理学
  • 電子工学および電気工学

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