Effect of oxygen plasma exposure of porous spin-on-glass films

E. Kondoh, T. Asano, A. Nakashima, M. Komatu

研究成果: ジャーナルへの寄稿記事

78 引用 (Scopus)

抜粋

The plasma oxidation of hydrogen methyl siloxane based porous spin on glass (SOG) films. The Fourier transform infrared (FTIR) analyses show that the intensities of hydrophobic groups decrease with plasma exposure time. An increase in the OH intensity and decrease in the film thickness were also observed. From ellipsometric analyses, it is determined that the loss of hydrophobic groups causes spontaneous film shrinkage. When the substrate was biased during O2 plasma exposure, less film oxidation, shrinkage and moisture uptake were observed. The mechanism that causes the suppressed oxidation was discussed from the point of view of competition between oxidation and sputtering.

元の言語英語
ページ(範囲)1276-1280
ページ数5
ジャーナルJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
18
発行部数3
DOI
出版物ステータス出版済み - 5 1 2000

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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