Effect of substrate interface on mechanical relaxation behavior in polymer ultrathin films

Keiichi Akabori, Keiji Tanaka, Toshihiko Nagamura, Atsushi Takahara, Tisato Kajiyama

研究成果: Contribution to conferencePaper査読

抄録

Mechanical relaxation behavior of polystyrene (PS) and poly (2-vinylprydine) (P2VP) thin and ultrathin films on substrates was examined. Even in the case of the ultrathin films, the α2-relaxation process corresponding to the segmental motion was successfully observed. However, the αa-absorption peak was broadened toward lower and higher temperature sides because of surface and interfacial effects. Interestingly, when a PS ultrathin film was sandwiched between SiOx layers, an additional peak come up with the interfacial segmental motion appeared at the higher temperature side. In the case of the P2VP ultrathin films on the SiOx substrates, the interfacial effect became remarkable due to the strong attractive interaction between chains and the substrate. Finally, it was concluded that chain mobility in the interfacial region was depressed in comparison with that in the internal bulk phase.

本文言語英語
ページ数1
出版ステータス出版済み - 12 1 2005
イベント54th SPSJ Annual Meeting 2005 - Yokohama, 日本
継続期間: 5 25 20055 27 2005

その他

その他54th SPSJ Annual Meeting 2005
Country日本
CityYokohama
Period5/25/055/27/05

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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