Effect of substrate interface on mechanical relaxation behavior in polymer ultrathin films

Keiichi Akabori, Keiji Tanaka, Toshihiko Nagamura, Atsushi Takahara, Tisato Kajiyama

研究成果: 会議への寄与タイプ論文

抄録

Mechanical relaxation behavior of polystyrene (PS) and poly (2-vinylprydine) (P2VP) thin and ultrathin films on substrates was examined. Even in the case of the ultrathin films, the α2-relaxation process corresponding to the segmental motion was successfully observed. However, the αa-absorption peak was broadened toward lower and higher temperature sides because of surface and interfacial effects. Interestingly, when a PS ultrathin film was sandwiched between SiOx layers, an additional peak come up with the interfacial segmental motion appeared at the higher temperature side. In the case of the P2VP ultrathin films on the SiOx substrates, the interfacial effect became remarkable due to the strong attractive interaction between chains and the substrate. Finally, it was concluded that chain mobility in the interfacial region was depressed in comparison with that in the internal bulk phase.

元の言語英語
ページ数1
出版物ステータス出版済み - 12 1 2005
イベント54th SPSJ Annual Meeting 2005 - Yokohama, 日本
継続期間: 5 25 20055 27 2005

その他

その他54th SPSJ Annual Meeting 2005
日本
Yokohama
期間5/25/055/27/05

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Anelastic relaxation
Ultrathin films
Polymer films
Substrates
Polystyrenes
Relaxation processes
Thin films
Temperature

All Science Journal Classification (ASJC) codes

  • Engineering(all)

これを引用

Akabori, K., Tanaka, K., Nagamura, T., Takahara, A., & Kajiyama, T. (2005). Effect of substrate interface on mechanical relaxation behavior in polymer ultrathin films. 論文発表場所 54th SPSJ Annual Meeting 2005, Yokohama, 日本.

Effect of substrate interface on mechanical relaxation behavior in polymer ultrathin films. / Akabori, Keiichi; Tanaka, Keiji; Nagamura, Toshihiko; Takahara, Atsushi; Kajiyama, Tisato.

2005. 論文発表場所 54th SPSJ Annual Meeting 2005, Yokohama, 日本.

研究成果: 会議への寄与タイプ論文

Akabori, K, Tanaka, K, Nagamura, T, Takahara, A & Kajiyama, T 2005, 'Effect of substrate interface on mechanical relaxation behavior in polymer ultrathin films', 論文発表場所 54th SPSJ Annual Meeting 2005, Yokohama, 日本, 5/25/05 - 5/27/05.
Akabori K, Tanaka K, Nagamura T, Takahara A, Kajiyama T. Effect of substrate interface on mechanical relaxation behavior in polymer ultrathin films. 2005. 論文発表場所 54th SPSJ Annual Meeting 2005, Yokohama, 日本.
Akabori, Keiichi ; Tanaka, Keiji ; Nagamura, Toshihiko ; Takahara, Atsushi ; Kajiyama, Tisato. / Effect of substrate interface on mechanical relaxation behavior in polymer ultrathin films. 論文発表場所 54th SPSJ Annual Meeting 2005, Yokohama, 日本.1 p.
@conference{c895d274809a41eaaed198db1ec4542d,
title = "Effect of substrate interface on mechanical relaxation behavior in polymer ultrathin films",
abstract = "Mechanical relaxation behavior of polystyrene (PS) and poly (2-vinylprydine) (P2VP) thin and ultrathin films on substrates was examined. Even in the case of the ultrathin films, the α2-relaxation process corresponding to the segmental motion was successfully observed. However, the αa-absorption peak was broadened toward lower and higher temperature sides because of surface and interfacial effects. Interestingly, when a PS ultrathin film was sandwiched between SiOx layers, an additional peak come up with the interfacial segmental motion appeared at the higher temperature side. In the case of the P2VP ultrathin films on the SiOx substrates, the interfacial effect became remarkable due to the strong attractive interaction between chains and the substrate. Finally, it was concluded that chain mobility in the interfacial region was depressed in comparison with that in the internal bulk phase.",
author = "Keiichi Akabori and Keiji Tanaka and Toshihiko Nagamura and Atsushi Takahara and Tisato Kajiyama",
year = "2005",
month = "12",
day = "1",
language = "English",
note = "54th SPSJ Annual Meeting 2005 ; Conference date: 25-05-2005 Through 27-05-2005",

}

TY - CONF

T1 - Effect of substrate interface on mechanical relaxation behavior in polymer ultrathin films

AU - Akabori, Keiichi

AU - Tanaka, Keiji

AU - Nagamura, Toshihiko

AU - Takahara, Atsushi

AU - Kajiyama, Tisato

PY - 2005/12/1

Y1 - 2005/12/1

N2 - Mechanical relaxation behavior of polystyrene (PS) and poly (2-vinylprydine) (P2VP) thin and ultrathin films on substrates was examined. Even in the case of the ultrathin films, the α2-relaxation process corresponding to the segmental motion was successfully observed. However, the αa-absorption peak was broadened toward lower and higher temperature sides because of surface and interfacial effects. Interestingly, when a PS ultrathin film was sandwiched between SiOx layers, an additional peak come up with the interfacial segmental motion appeared at the higher temperature side. In the case of the P2VP ultrathin films on the SiOx substrates, the interfacial effect became remarkable due to the strong attractive interaction between chains and the substrate. Finally, it was concluded that chain mobility in the interfacial region was depressed in comparison with that in the internal bulk phase.

AB - Mechanical relaxation behavior of polystyrene (PS) and poly (2-vinylprydine) (P2VP) thin and ultrathin films on substrates was examined. Even in the case of the ultrathin films, the α2-relaxation process corresponding to the segmental motion was successfully observed. However, the αa-absorption peak was broadened toward lower and higher temperature sides because of surface and interfacial effects. Interestingly, when a PS ultrathin film was sandwiched between SiOx layers, an additional peak come up with the interfacial segmental motion appeared at the higher temperature side. In the case of the P2VP ultrathin films on the SiOx substrates, the interfacial effect became remarkable due to the strong attractive interaction between chains and the substrate. Finally, it was concluded that chain mobility in the interfacial region was depressed in comparison with that in the internal bulk phase.

UR - http://www.scopus.com/inward/record.url?scp=33645643062&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33645643062&partnerID=8YFLogxK

M3 - Paper

AN - SCOPUS:33645643062

ER -