Effect of the boron-to-nitrogen ratio on leakage current characteristics of boron nitride films prepared by surface-wave plasma enhanced chemical vapor deposition

Y. Kamimura, T. Matsuura, K. Teii, S. Matsumoto

研究成果: Contribution to journalArticle査読

2 被引用数 (Scopus)

抄録

Sp2-bonded boron nitride (BN) films with different B-to-N ratios are deposited on Si and Ni substrates at an ion impact energy of around 50 eV by surface-wave plasma enhanced chemical vapor deposition. The overall crystallinity and order of sp2 bonding structure are almost retained with increasing BF3/N2 gas flow ratio in the plasma, while the B-to-N ratio in the film is varied from 0.89 to 0.96. The electrical resistivity of the films measured at room temperature for Ni-BN-Ni structures shows a large increase up to the order of 1010 Ω cm when the B-to-N ratio in the film is increased closer to the stoichiometry due to a lower density of defect states related to the boron vacancy. The characteristics of leakage current vs. applied bias voltage show Ohmic behavior at low fields and non-Ohmic behavior governed by the thermionic emission mechanism at high fields for any B-to-N ratio.

本文言語英語
論文番号138029
ジャーナルThin Solid Films
706
DOI
出版ステータス出版済み - 7 31 2020

All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • 表面および界面
  • 表面、皮膜および薄膜
  • 金属および合金
  • 材料化学

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