Effect of thermal strain on domain fraction in a-/b-axis-oriented epitaxial Bi4Ti3O12 films

Takayuki Watanabe, Hitoshi Morioka, Shoji Okamoto, Masatake Takahashi, Yuji Noguchi, Masaru Miyayama, Hiroshi Funakubo

研究成果: Contribution to journalConference article査読

抄録

a-/b-axis-oriented epitaxial Bi4Ti3O12 and neodymiura-substituted Bi4Ti3O12 films with a different a-domain fraction, V(100)/[V(100)+V( 010)], were grown by metalorganic chemical vapor deposition above the phase transition temperature. It was demonstrated that the saturation polarization observed for the a-/b-axis-oriented film is proportional to the a-domain fraction estimated by x-ray diffraction. The liner relationship passing through the origin revealed that the 90° domain switching by an external electric field hardly occurred. The extrapolation gave spontaneous polarization of 58 μC/cm for a pure a-axis-oriented (Bi3.5Nd 0.5)Ti3O12 film. The domain fraction was investigated as a function of thermal strain originated from a difference in thermal expansion coefficient between the film and substrates. The domain fraction of the films changed with the thermal strain along the in-plane [010] in tetragonal a-axis-oriented films as well as epitaxially grown tetragonal Pb(Zr,Ti)O3 films.

本文言語英語
ページ(範囲)109-114
ページ数6
ジャーナルMaterials Research Society Symposium - Proceedings
784
DOI
出版ステータス出版済み - 2003
外部発表はい
イベントFerroelectric Thin Films XII - Boston, MA, 米国
継続期間: 12 1 200312 4 2003

All Science Journal Classification (ASJC) codes

  • 材料科学(全般)
  • 凝縮系物理学
  • 材料力学
  • 機械工学

フィンガープリント

「Effect of thermal strain on domain fraction in a-/b-axis-oriented epitaxial Bi<sub>4</sub>Ti<sub>3</sub>O<sub>12</sub> films」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル