Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas

Kunihiro Kamataki, Hiroshi Miyata, Kazunori Koga, Giichiro Uchida, Naho Itagaki, Daisuke Yamashita, Hidefumi Matsuzaki, Masaharu Shiratani

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

1 被引用数 (Scopus)

抄録

We have first conformed the effects of amplitude modulation (AM) of rf discharge voltage on growth of nano-particles in plasma CVD. This method of AM was used to control fluctuation level of plasma parameters, and allow us to investigate the causal relationship between the nano-particle property and plasma fluctuations. We found the ratio of power of single mode to that harmonic mode is negligible small until fluctuation level of amplitude modulated rf peak-to-peak voltage becomes roughly 20 %. The growth of nano-particles during rf discharge decreased as induced plasma fluctuation level increases.

本文言語英語
ホスト出版物のタイトルTENCON 2010 - 2010 IEEE Region 10 Conference
ページ1943-1947
ページ数5
DOI
出版ステータス出版済み - 2010
イベント2010 IEEE Region 10 Conference, TENCON 2010 - Fukuoka, 日本
継続期間: 11 21 201011 24 2010

その他

その他2010 IEEE Region 10 Conference, TENCON 2010
Country日本
CityFukuoka
Period11/21/1011/24/10

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Computer Science Applications

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