Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas

Kunihiro Kamataki; Hiroshi Miyata; Kazunori Koga; Giichiro Uchida; Naho Itagaki; Daisuke Yamashita; Hidefumi Matsuzaki; Masaharu Shiratani

doi:10.1109/TENCON.2010.5686456

Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas

Kunihiro Kamataki, Hiroshi Miyata, Kazunori Koga, Giichiro Uchida, Naho Itagaki, Daisuke Yamashita, Hidefumi Matsuzaki, Masaharu Shiratani

研究成果: Chapter in Book/Report/Conference proceeding › Conference contribution

1 被引用数 (Scopus)

抄録

We have first conformed the effects of amplitude modulation (AM) of rf discharge voltage on growth of nano-particles in plasma CVD. This method of AM was used to control fluctuation level of plasma parameters, and allow us to investigate the causal relationship between the nano-particle property and plasma fluctuations. We found the ratio of power of single mode to that harmonic mode is negligible small until fluctuation level of amplitude modulated rf peak-to-peak voltage becomes roughly 20 %. The growth of nano-particles during rf discharge decreased as induced plasma fluctuation level increases.

本文言語	英語
ホスト出版物のタイトル	TENCON 2010 - 2010 IEEE Region 10 Conference
ページ	1943-1947
ページ数	5
DOI	https://doi.org/10.1109/TENCON.2010.5686456
出版ステータス	出版済み - 2010
イベント	2010 IEEE Region 10 Conference, TENCON 2010 - Fukuoka, 日本継続期間: 11 21 2010 → 11 24 2010

その他

その他	2010 IEEE Region 10 Conference, TENCON 2010
Country	日本
City	Fukuoka
Period	11/21/10 → 11/24/10

All Science Journal Classification (ASJC) codes

Electrical and Electronic Engineering
Computer Science Applications

文献へのアクセス

10.1109/TENCON.2010.5686456

フィンガープリント「Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル

Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas. / Kamataki, Kunihiro; Miyata, Hiroshi; Koga, Kazunori; Uchida, Giichiro; Itagaki, Naho; Yamashita, Daisuke; Matsuzaki, Hidefumi; Shiratani, Masaharu.

TENCON 2010 - 2010 IEEE Region 10 Conference. 2010. p. 1943-1947 5686456.

研究成果: Chapter in Book/Report/Conference proceeding › Conference contribution

Kamataki, K, Miyata, H, Koga, K, Uchida, G, Itagaki, N, Yamashita, D, Matsuzaki, H & Shiratani, M 2010, Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas. in TENCON 2010 - 2010 IEEE Region 10 Conference., 5686456, pp. 1943-1947, 2010 IEEE Region 10 Conference, TENCON 2010, Fukuoka, 日本, 11/21/10. https://doi.org/10.1109/TENCON.2010.5686456

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abstract = "We have first conformed the effects of amplitude modulation (AM) of rf discharge voltage on growth of nano-particles in plasma CVD. This method of AM was used to control fluctuation level of plasma parameters, and allow us to investigate the causal relationship between the nano-particle property and plasma fluctuations. We found the ratio of power of single mode to that harmonic mode is negligible small until fluctuation level of amplitude modulated rf peak-to-peak voltage becomes roughly 20 %. The growth of nano-particles during rf discharge decreased as induced plasma fluctuation level increases.",

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AU - Kamataki, Kunihiro

AU - Miyata, Hiroshi

AU - Koga, Kazunori

AU - Uchida, Giichiro

AU - Itagaki, Naho

AU - Yamashita, Daisuke

AU - Matsuzaki, Hidefumi

AU - Shiratani, Masaharu

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AB - We have first conformed the effects of amplitude modulation (AM) of rf discharge voltage on growth of nano-particles in plasma CVD. This method of AM was used to control fluctuation level of plasma parameters, and allow us to investigate the causal relationship between the nano-particle property and plasma fluctuations. We found the ratio of power of single mode to that harmonic mode is negligible small until fluctuation level of amplitude modulated rf peak-to-peak voltage becomes roughly 20 %. The growth of nano-particles during rf discharge decreased as induced plasma fluctuation level increases.

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