Effects of cluster incorporation into hydrogenated amorphous silicon films in initial discharge phase on film stability

Susumu Toko, Yoshihiro Torigoe, Weiting Chen, Daisuke Yamashita, Hyunwoong Seo, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

研究成果: Contribution to journalArticle査読

10 被引用数 (Scopus)

抄録

We studied the effects of incorporation of hydrogenated amorphous silicon (a-Si:H) nanoparticles (clusters) generated in the initial discharge phase on light induced degradation of a-Si:H films. The amount of clusters incorporated into the films in the initial discharge phase is 15 times larger than that in the steady state. To evaluate the effects of such initial cluster incorporation on stability of a-Si:H films, we fabricated a-Si:H Schottky cells with and without initial cluster incorporation using a multi-hollow discharge plasma chemical vapor deposition method with a shutter and compared cell stability against light exposure. The degradation ratio of the cell without initial cluster incorporation is less than 1% even after 100 hour light soaking of 2.7 suns. Our results show that suppressing initial cluster incorporation into a-Si:H films is a key to stable a-Si:H cells. Moreover, Si-H2 bonds in films can be reduced down to 1/10 using a cluster eliminating filter.

本文言語英語
ページ(範囲)126-131
ページ数6
ジャーナルThin Solid Films
587
DOI
出版ステータス出版済み - 7 31 2015

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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