We have developed a cluster-eliminating filter which reduces amount of amorphous silicon nanoparticles (clusters) incorporated into a-Si:H films. We have measured film thickness dependence of a ratio of a hydrogen content associated with Si-H2 bonds (CSiH2) to that with Si-H bonds (CSiH) as a parameter of the filter gap (dgap). The cluster removal efficiency increases with decreasing dgap. CSiH2 and the ratio of CSiH2 to CSiH decrease with increasing the film thickness, suggesting the amount of incorporated clusters is high near the interface between the film and the substrate.
|ジャーナル||Journal of Physics: Conference Series|
|出版物ステータス||出版済み - 1 1 2014|
|イベント||26th Symposium on Plasma Sciences for Materials, SPSM 2013 - Fukuoka, 日本|
継続期間: 9 23 2013 → 9 24 2013
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)