Effects of gas velocity on deposition rate and amount of cluster incorporation into a-Si:H films fabricated by SiH4 plasma chemical vapor deposition

Takashi Kojima, Susumu Toko, Kazuma Tanaka, Hyunwoong Seo, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

研究成果: Contribution to journalArticle査読

3 被引用数 (Scopus)

抄録

To deposit stable a-Si:H films at a high deposition rate (DR), we have studied time evolution of DR and amount of cluster incorporation (R) into films as a parameter of gas velocity, in the downstream region of a multi-hollow discharge plasma chemical vapor deposition reactor; because a-Si:H films containing less cluster incorporation show high stability. For a low gas velocity of 0.18m/s, clusters are trapped between the multihollow electrode and the substrate and the trapped clusters absorb clusters and such absorption suppresses the cluster incorporation into films. By utilizing this phenomenon, we have realized a quite low R = 1.3 at a high DR = 0.06 nm/s.

本文言語英語
論文番号1406082
ジャーナルPlasma and Fusion Research
13
DOI
出版ステータス出版済み - 2018

All Science Journal Classification (ASJC) codes

  • 凝縮系物理学

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