Effects of hydrogen dilution on ZnO thin films fabricated via nitrogen-mediated crystallization

Iping Suhariadi, Koichi Matsushima, Kazunori Kuwahara, Koichi Oshikawa, Daisuke Yamashita, Hyunwoong Seo, Giichiro Uchida, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani, Sven Bornholdt, Holger Kersten, Harm Wulff, Naho Itagaki

研究成果: Contribution to journalArticle

11 引用 (Scopus)

抜粋

Hydrogenated ZnO thin films have been successfully deposited on glass substrates via a nitrogen mediated crystallization (NMC) method utilizing RF sputtering. Here we aim to study the crystallinity and electrical properties of hydrogenated NMC-ZnO films in correlation with substrate temperature and H 2 flow rate. XRD measurements reveal that all the deposited films exhibit strongly preferred (001) orientation. The integral breadth of the (002) peak from the hydrogenated NMC-ZnO films is smaller than that of the conventional hydrogenated ZnO films fabricated without nitrogen. Furthermore, the crystallinity and surface morphology of the hydrogenated NMC-ZnO films are improved by increasing substrate temperature to 400 °C, where the smallest integral breadth of (002) 2θ-ω scans of 0.83° has been obtained. By utilizing the hydrogenated NMCZnO films as buffer layers, the crystallinity of ZnO:Al (AZO) films is also improved. The resistivity of AZO films on NMC-ZnO buffer layers decreases with increasing H2 flow rate during the sputter deposition of buffer layers from 0 to 5 sccm. At a H2 flow rate of 5 sccm, 20-nm-thick AZO films with low resistivity of 1.5 × 10.3 Ωcm have been obtained.

元の言語英語
記事番号01AC08
ジャーナルJapanese journal of applied physics
52
発行部数1 PART2
DOI
出版物ステータス出版済み - 1 2013

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

フィンガープリント Effects of hydrogen dilution on ZnO thin films fabricated via nitrogen-mediated crystallization' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

  • これを引用

    Suhariadi, I., Matsushima, K., Kuwahara, K., Oshikawa, K., Yamashita, D., Seo, H., Uchida, G., Kamataki, K., Koga, K., Shiratani, M., Bornholdt, S., Kersten, H., Wulff, H., & Itagaki, N. (2013). Effects of hydrogen dilution on ZnO thin films fabricated via nitrogen-mediated crystallization. Japanese journal of applied physics, 52(1 PART2), [01AC08]. https://doi.org/10.7567/JJAP.52.01AC08