Effects of sputtering pressure on (Zno)x(inn)1-x crystal film growth at 450ºc

Naho Itagaki, Kazuto Takeuchi, Nanoka Miyahara, Kouki Imoto, Hyunwoong Seo, Kazunori Koga, Masaharu Shiratani

研究成果: 著書/レポートタイプへの貢献会議での発言

抄録

We studied effects of sputtering pressure on growth of (ZnO)x(InN)1-x crystal films deposited at 450ºC by rf magnetron sputtering. Epitaxial growth of (ZnO)x(InN)1-x films was realized on single-crystalline ZnO template. X-ray diffraction measurements show that full width at half maximum of the rocking curves from the (101) plane of the films reaches minimum value of 0.11˚ at 0.5 Pa. The sputtering gas pressure is a key tuning knob for controlling the crystal quality of ZION films.

元の言語英語
ホスト出版物のタイトルTHERMEC 2018
編集者R. Shabadi, Tara Chandra, Mihail Ionescu, M. Jeandin, C. Richard
出版者Trans Tech Publications Ltd
ページ2093-2098
ページ数6
ISBN(印刷物)9783035712087
DOI
出版物ステータス出版済み - 1 1 2018
イベント10th International Conference on Processing and Manufacturing of Advanced Materials, 2018 - Paris, フランス
継続期間: 7 9 20187 13 2018

出版物シリーズ

名前Materials Science Forum
941 MSF
ISSN(印刷物)0255-5476

会議

会議10th International Conference on Processing and Manufacturing of Advanced Materials, 2018
フランス
Paris
期間7/9/187/13/18

Fingerprint

Film growth
Crystal growth
Sputtering
sputtering
crystals
knobs
Knobs
Crystals
Full width at half maximum
Epitaxial growth
Magnetron sputtering
gas pressure
magnetron sputtering
templates
Tuning
Gases
tuning
Crystalline materials
X ray diffraction
curves

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

これを引用

Itagaki, N., Takeuchi, K., Miyahara, N., Imoto, K., Seo, H., Koga, K., & Shiratani, M. (2018). Effects of sputtering pressure on (Zno)x(inn)1-x crystal film growth at 450ºc. : R. Shabadi, T. Chandra, M. Ionescu, M. Jeandin, & C. Richard (版), THERMEC 2018 (pp. 2093-2098). (Materials Science Forum; 巻数 941 MSF). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/MSF.941.2093

Effects of sputtering pressure on (Zno)x(inn)1-x crystal film growth at 450ºc. / Itagaki, Naho; Takeuchi, Kazuto; Miyahara, Nanoka; Imoto, Kouki; Seo, Hyunwoong; Koga, Kazunori; Shiratani, Masaharu.

THERMEC 2018. 版 / R. Shabadi; Tara Chandra; Mihail Ionescu; M. Jeandin; C. Richard. Trans Tech Publications Ltd, 2018. p. 2093-2098 (Materials Science Forum; 巻 941 MSF).

研究成果: 著書/レポートタイプへの貢献会議での発言

Itagaki, N, Takeuchi, K, Miyahara, N, Imoto, K, Seo, H, Koga, K & Shiratani, M 2018, Effects of sputtering pressure on (Zno)x(inn)1-x crystal film growth at 450ºc. : R Shabadi, T Chandra, M Ionescu, M Jeandin & C Richard (版), THERMEC 2018. Materials Science Forum, 巻. 941 MSF, Trans Tech Publications Ltd, pp. 2093-2098, 10th International Conference on Processing and Manufacturing of Advanced Materials, 2018, Paris, フランス, 7/9/18. https://doi.org/10.4028/www.scientific.net/MSF.941.2093
Itagaki N, Takeuchi K, Miyahara N, Imoto K, Seo H, Koga K その他. Effects of sputtering pressure on (Zno)x(inn)1-x crystal film growth at 450ºc. : Shabadi R, Chandra T, Ionescu M, Jeandin M, Richard C, 編集者, THERMEC 2018. Trans Tech Publications Ltd. 2018. p. 2093-2098. (Materials Science Forum). https://doi.org/10.4028/www.scientific.net/MSF.941.2093
Itagaki, Naho ; Takeuchi, Kazuto ; Miyahara, Nanoka ; Imoto, Kouki ; Seo, Hyunwoong ; Koga, Kazunori ; Shiratani, Masaharu. / Effects of sputtering pressure on (Zno)x(inn)1-x crystal film growth at 450ºc. THERMEC 2018. 編集者 / R. Shabadi ; Tara Chandra ; Mihail Ionescu ; M. Jeandin ; C. Richard. Trans Tech Publications Ltd, 2018. pp. 2093-2098 (Materials Science Forum).
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