Effects of sputtering pressure on (Zno)x(inn)1-x crystal film growth at 450ºc

Naho Itagaki, Kazuto Takeuchi, Nanoka Miyahara, Kouki Imoto, Hyunwoong Seo, Kazunori Koga, Masaharu Shiratani

研究成果: 著書/レポートタイプへの貢献会議での発言

抜粋

We studied effects of sputtering pressure on growth of (ZnO)x(InN)1-x crystal films deposited at 450ºC by rf magnetron sputtering. Epitaxial growth of (ZnO)x(InN)1-x films was realized on single-crystalline ZnO template. X-ray diffraction measurements show that full width at half maximum of the rocking curves from the (101) plane of the films reaches minimum value of 0.11˚ at 0.5 Pa. The sputtering gas pressure is a key tuning knob for controlling the crystal quality of ZION films.

元の言語英語
ホスト出版物のタイトルTHERMEC 2018
編集者R. Shabadi, Mihail Ionescu, M. Jeandin, C. Richard, Tara Chandra
出版者Trans Tech Publications Ltd
ページ2093-2098
ページ数6
ISBN(印刷物)9783035712087
DOI
出版物ステータス出版済み - 1 1 2018
イベント10th International Conference on Processing and Manufacturing of Advanced Materials, 2018 - Paris, フランス
継続期間: 7 9 20187 13 2018

出版物シリーズ

名前Materials Science Forum
941 MSF
ISSN(印刷物)0255-5476
ISSN(電子版)1662-9752

会議

会議10th International Conference on Processing and Manufacturing of Advanced Materials, 2018
フランス
Paris
期間7/9/187/13/18

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

フィンガープリント Effects of sputtering pressure on (Zno)<sub>x</sub>(inn)<sub>1-x</sub> crystal film growth at 450ºc' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

  • これを引用

    Itagaki, N., Takeuchi, K., Miyahara, N., Imoto, K., Seo, H., Koga, K., & Shiratani, M. (2018). Effects of sputtering pressure on (Zno)x(inn)1-x crystal film growth at 450ºc. : R. Shabadi, M. Ionescu, M. Jeandin, C. Richard, & T. Chandra (版), THERMEC 2018 (pp. 2093-2098). (Materials Science Forum; 巻数 941 MSF). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/MSF.941.2093