Electrical property measurement of two-dimensional hole-gas layer on hydrogen-terminated diamond surface in vacuum-gap-gate structure

Masafumi Inaba, Hiroshi Kawarada, Yutaka Ohno

研究成果: ジャーナルへの寄稿記事

抄録

Hydrogen-terminated diamond metal-insulator-semiconductor field-effect transistors are candidates for power devices that require a high breakdown field and stable, high-frequency operation. A two-dimensional hole-gas layer can form on H-terminated diamond surfaces. To understand the electrical properties of bare H-terminated diamond surfaces, we investigate the surface impurities on a H-terminated diamond surface in a vacuum-gap gate structure, which uses a H-terminated diamond channel and a vacuum gap as gate dielectrics. To obtain a bare surface without surface adsorbate, the device is annealed in a vacuum. The transconductance is increased by removing adsorbates. The mobility and interface-state density at the H-terminated diamond surface with no adsorbates are 25 cm2 V-1 s-1 and 1 × 1012 cm-2 eV-1, respectively.

元の言語英語
記事番号253504
ジャーナルApplied Physics Letters
114
発行部数25
DOI
出版物ステータス出版済み - 6 24 2019

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diamonds
electrical properties
vacuum
hydrogen
gases
MIS (semiconductors)
transconductance
field effect transistors
breakdown
impurities

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

これを引用

Electrical property measurement of two-dimensional hole-gas layer on hydrogen-terminated diamond surface in vacuum-gap-gate structure. / Inaba, Masafumi; Kawarada, Hiroshi; Ohno, Yutaka.

:: Applied Physics Letters, 巻 114, 番号 25, 253504, 24.06.2019.

研究成果: ジャーナルへの寄稿記事

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