Electron-temperature dependence of nitrogen dissociation in 915 MHz ECR plasma

Naho Itagaki, S. Iwata, K. Muta, A. Yonesu, S. Kawakami, N. Ishii, Y. Kawai

研究成果: Contribution to journalConference article

47 引用 (Scopus)

抜粋

The nitrogen molecular dissociation level in 915 MHz ECR plasma was evaluated as a function of the electron temperature by optical emission spectroscopy. The intensity ratio of N line to N2 line, which provides information on changes in the degree of dissociation of nitrogen molecules, was found to increase monotonously from 0.01 to 0.07 with increasing the electron temperature from 2 to 7 eV. Furthermore, it was confirmed that increasing the electron density and/or the introduction of argon in the discharge significantly enhanced the nitrogen molecular dissociation level.

元の言語英語
ページ(範囲)259-263
ページ数5
ジャーナルThin Solid Films
435
発行部数1-2
DOI
出版物ステータス出版済み - 7 1 2003
イベントProccedings of the Joint International Plasma Symposium - Jeju Island, 大韓民国
継続期間: 7 1 20027 4 2002

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

フィンガープリント Electron-temperature dependence of nitrogen dissociation in 915 MHz ECR plasma' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

  • これを引用

    Itagaki, N., Iwata, S., Muta, K., Yonesu, A., Kawakami, S., Ishii, N., & Kawai, Y. (2003). Electron-temperature dependence of nitrogen dissociation in 915 MHz ECR plasma. Thin Solid Films, 435(1-2), 259-263. https://doi.org/10.1016/S0040-6090(03)00395-X