Emission characteristics of extreme ultraviolet radiation from CO 2 laser-produced xenon plasma

Hiroki Tanaka, Koji Akinaga, Akihiko Takahashi, Tatsuo Okada

研究成果: Contribution to journalArticle査読

33 被引用数 (Scopus)

抄録

We propose a CO2 laser-produced plasma as the extreme ultraviolet (EUV) light source for a future optical lithography system. The EUV radiation around 13.5 nm was generated by focusing the laser beam from a transversely-excited atmospheric CO2 laser (4J, 50ns full width at half-maximum (FWHM)) on a Xe gas target and a Xe cryogenic target. The EUV energy was measured by a Flying Circus II detecting system, and an output energy of more than 3 mJ/pulse and an conversion efficiency of more than 0.1% per 2π sr at 13.5 nm were obtained. These values are comparable to those of Nd:YAG laser-produced plasma, indicating the potential scalability of the EUV light source using a CO2 laser produced plasma.

本文言語英語
ページ(範囲)L585-L587
ジャーナルJapanese Journal of Applied Physics, Part 2: Letters
43
4 B
DOI
出版ステータス出版済み - 4 15 2004

All Science Journal Classification (ASJC) codes

  • 工学(全般)
  • 物理学および天文学(その他)
  • 物理学および天文学(全般)

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