We propose a CO2 laser-produced plasma as the extreme ultraviolet (EUV) light source for a future optical lithography system. The EUV radiation around 13.5 nm was generated by focusing the laser beam from a transversely-excited atmospheric CO2 laser (4J, 50ns full width at half-maximum (FWHM)) on a Xe gas target and a Xe cryogenic target. The EUV energy was measured by a Flying Circus II detecting system, and an output energy of more than 3 mJ/pulse and an conversion efficiency of more than 0.1% per 2π sr at 13.5 nm were obtained. These values are comparable to those of Nd:YAG laser-produced plasma, indicating the potential scalability of the EUV light source using a CO2 laser produced plasma.
|ジャーナル||Japanese Journal of Applied Physics, Part 2: Letters|
|出版ステータス||出版済み - 4 15 2004|
All Science Journal Classification (ASJC) codes