Enhanced diffusion of Nb in Nb-H alloys by hydrogen-induced vacancies

Takahiro Iida, Yoshihiro Yamazaki, Takayuki Kobayashi, Yoshiaki Iijima, Yuh Fukai

研究成果: ジャーナルへの寄稿学術誌査読

41 被引用数 (Scopus)

抄録

The diffusion coefficient of 95Nb in pure Nb and Nb-H alloys whose hydrogen concentration ranges between H/Nb = 0.05 and 0.34 in atomic ratio has been determined in the temperature range 823-1598 K using a serial sputter-microsectioning technique. The diffusion coefficient of Nb in the Nb-H alloys was found to increase significantly with increasing hydrogen concentration. The dependence of the diffusion enhancement on temperature and hydrogen concentration was examined in some detail, and explained tentatively in terms of average occupation number of hydrogen atoms per vacancy, r. The diffusion enhancement comes primarily from the decrease of the activation energy Q, resulting from the increase of r with increase of hydrogen concentration. Some remaining problems with this interpretation are pointed out for future investigations.

本文言語英語
ページ(範囲)3083-3089
ページ数7
ジャーナルActa Materialia
53
10
DOI
出版ステータス出版済み - 6月 2005
外部発表はい

!!!All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • セラミックおよび複合材料
  • ポリマーおよびプラスチック
  • 金属および合金

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