Estimation of negative ions in VHF SiH4/H2 plasma

Tsukasa Yamane, Shinya Nakano, Sachiko Nakao, Yoshiaki Takeuchi, Ryuta Ichiki, Hiroshi Muta, Kiichiro Uchino, Yoshinobu Kawai

研究成果: ジャーナルへの寄稿記事

2 引用 (Scopus)

抜粋

The characteristics of a VHF SiH4/H2 plasma (frequency: 60 MHz) at high pressures were examined as a function of silane concentration with a heated Langmuir probe. Anomalous reductions in electron saturation current were observed, suggesting the existence of many negative ions. An estimation of the concentration of negative ions was attempted using the sheath theory including negative ions. It was found that there exist H- and SiH3- ions as dominant negative ions in the VHF SiH4/H2 plasma. In addition, the measured floating potential agreed with the theoretical value.

元の言語英語
記事番号116101
ジャーナルJapanese Journal of Applied Physics
53
発行部数11
DOI
出版物ステータス出版済み - 11 1 2014

    フィンガープリント

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

これを引用

Yamane, T., Nakano, S., Nakao, S., Takeuchi, Y., Ichiki, R., Muta, H., ... Kawai, Y. (2014). Estimation of negative ions in VHF SiH4/H2 plasma. Japanese Journal of Applied Physics, 53(11), [116101]. https://doi.org/10.7567/JJAP.53.116101