Estimation of the mobility of low temperature polycrystalline silicon thin film transistors through deep learning

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

抄録

The crystallization of a-Si leads to alterations in the morphology of Si film such as surface color and surface roughness as a result of excimer laser annealing (ELA). These surface changes correlate with the characteristics of polysilicon films. The quality of crystallized poly Si has been evaluated by Non-destructive optical inspection methods. This study aims to use deep learning to estimate the quantitative relationship between the microscope images of a low-temperature polycrystalline silicon (LTPS) film and the mobility of an LTPS thin film transistor (TFT). This method would make it possible to measure the mobility from the images captured after annealing and improve the crystallization by in situ feedback. An a-Si substrate with a film thickness of 100 nm was polycrystallized by employing a KrF (wavelength of 248 nm) excimer laser, after which an optical microscope image of the substrate was captured. By changing the laser fluence and the number of shots (44 conditions N=10), LTPS films of various surface morphology were fabricated. We fabricated 440 transistors using these LTPS channels (channel size L = 20 μm, W = 30 μm) and measured their mobilities. Then, we performed deep learning with these sets of annealed optical microscope images and the corresponding mobilities. The mobility was estimated with an accuracy of ±12.8 cm2V-1s-1. Further improvement of the prediction accuracy (<±5 %) is needed for in-situ feedback. We plan to increase the number of images and use transfer learning to improve prediction accuracy.

本文言語英語
ホスト出版物のタイトルLaser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXVI
編集者Carlos Molpeceres, Jie Qiao, Aiko Narazaki
出版社SPIE
ISBN(電子版)9781510641815
DOI
出版ステータス出版済み - 2021
イベントLaser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXVI 2021 - Virtual, Online, 米国
継続期間: 3 6 20213 11 2021

出版物シリーズ

名前Proceedings of SPIE - The International Society for Optical Engineering
11673
ISSN(印刷版)0277-786X
ISSN(電子版)1996-756X

会議

会議Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXVI 2021
国/地域米国
CityVirtual, Online
Period3/6/213/11/21

All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • コンピュータ サイエンスの応用
  • 応用数学
  • 電子工学および電気工学

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