Fabrication of EBC System with Oxide Eutectic Structure

Shunkichi Ueno, Kyosuke Seya, Byung Koog Jang

研究成果: Chapter in Book/Report/Conference proceedingChapter

抄録

In this paper, the fabrication method and the formation mechanism of a new EBC system with Al2O3-HfO2 eutectic structure are discussed. A rapid heating process is required for the fabrication of Al2O3-HfO2 eutectic EBC film on silicon carbide substrate. Optical zone melting method was applied for the fabrication method of the eutectic EBC film. At high temperature under light focusing, a small amount of silicon carbide decomposed into silicon and carbon and each component of the Al2O3 and HfO2 in molten phase reacts with the free carbon. And a small amount of Al2O3 component reacts with the free carbon and vaporized from the molten phase. The composition of the molten phase becomes H HfO2 rich. HfO2 phase is also reacts with the free carbon and HfC phase is solidified on the silicon carbide substrate. A high density intermediate layer consisted of HfC is formed. When the solidification process finished before all of HfO2 phase is reduced to HfC phase, HfC-HfO2 functionally graded layer is formed on the silicon carbide substrate. The Al2O3-HfO2 eutectic structure grows from the top of the intermediate layer.

本文言語英語
ホスト出版物のタイトルCeramic Transactions
出版社Wiley-Blackwell
ページ65-72
ページ数8
256
ISBN(電子版)9781119234593
ISBN(印刷版)9781119234586
DOI
出版ステータス出版済み - 5 31 2016
外部発表はい

All Science Journal Classification (ASJC) codes

  • 工学(全般)
  • 材料科学(全般)

フィンガープリント

「Fabrication of EBC System with Oxide Eutectic Structure」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル