Fabrication of hierarchically ordered hybrid structures over multiple length scales via direct etching of self-organized polyhedral oligomeric silsesquioxane (POSS) functionalized block copolymer films
Teruaki Hayakawa, Makoto Seino, Raita Goseki, Tomoyasu Hirai, Ryohei Kikuchi, Masa Aki Kakimoto, Masatoshi Tokita, Hideaki Yokoyama, Shin Horiuchi
研究成果: ジャーナルへの寄稿 › 学術誌 › 査読
28
被引用数
(Scopus)