Fabrication of nanoparticle composite porous films having ultralow dielectric constant

Shota Nunomura, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe, Yoshinori Morisada, Nobuo Matsuki, Shingo Ikeda

研究成果: Contribution to journalArticle

41 被引用数 (Scopus)

抄録

Nanoparticle composite porous films having a dielectric constant of ε, = 1.7-3.5 have been deposited using plasma chemical vapor deposition. Nanoparticles as nano-building blocks and radicals as adhesives are generated in plasmas, and nanoparticles are deposited together with radicals on substrates to form porous films. Nano-sized pores are dispersed in the films and their dielectric constants are controlled by the concentrations of pores, i.e., their porosities. The method is applicable to depositing nanoparticle composite porous films for other applications.

本文言語英語
ページ(範囲)L1509-L1511
ジャーナルJapanese Journal of Applied Physics, Part 2: Letters
44
50-52
DOI
出版ステータス出版済み - 12 16 2005

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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