Fabrication of nanopillar micropatterns by hybrid mask lithography for surface-directed liquid flow

Shinya Sakuma, Masakuni Sugita, Fumihito Arai

研究成果: Contribution to journalArticle査読

4 被引用数 (Scopus)

抄録

This paper presents a novel method for fabricating nanopillar micropatterns for surface-directed liquid flows. It employs hybrid mask lithography, which uses a mask consisting of a combination of a photoresist and nanoparticles in the photolithography process. The nanopillar density is controlled by varying the weight ratio of nanoparticles in the composite mask. Hybrid mask lithography was used to fabricate a surface-directed liquid flow. The effect of the surface-directed liquid flow, which was formed by the air-liquid interface due to nanopillar micropatterns, was evaluated, and the results show that the oscillation of microparticles, when the micro-tool was actuated, was dramatically reduced by using a surface-directed liquid flow. Moreover, the target particle was manipulated individually without non-oscillating ambient particles.

本文言語英語
ページ(範囲)232-242
ページ数11
ジャーナルMicromachines
4
2
DOI
出版ステータス出版済み - 2013
外部発表はい

All Science Journal Classification (ASJC) codes

  • 制御およびシステム工学
  • 機械工学
  • 電子工学および電気工学

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