Fabrication of open-top microchannel plate using deep X-ray exposure mask made with silicon on insulator substrate

Tsuyoshi Fujimura, Akihiro Ikeda, Shin Ichi Etoh, Reiji Hattori, Yukinori Kuroki, Suk Sang Chang

研究成果: ジャーナルへの寄稿記事

11 引用 (Scopus)

抜粋

We propose a high-aspect-ratio open-top microchannel plate structure. This type of microchannel plate has many advantages in electrophoresis. The plate was fabricated by deep X-ray lithography using synchrotron radiation (SR) light and the chemical wet etching process. A deep X-ray exposure mask was fabricated with a silicon on insulator (SOI) substrate. The patterned Si microstructure was micromachined into a thin Si membrane and a thick Au X-ray absorber was embedded in it by electroplating. A plastic material, polymethylmethacrylate (PMMA) was used for the plate substrate. For reduction of the exposure time and high-aspect-ratio fast wet development, the fabrication condition was optimized with respect to not the exposure dose but to the PMMA mean molecular weight (M.W.) changing after deep X-ray exposure as measured by gel permeation chromatography (GPC). Decrement of the PMMA M.W. and increment of the wet developer temperature accelerated the etching rate. Under optimized fabrication conditions, a microchannel with 50 μm width through 1000 μm PMMA plate, with a high aspect ratio over 20, was fabricated. By using a high-aspect-ratio open-top microchannel plate, high fluorescent electrophoresis was performed.

元の言語英語
ページ(範囲)4102-4106
ページ数5
ジャーナルJapanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
42
発行部数6 B
出版物ステータス出版済み - 6 2003

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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