We propose a high-aspect-ratio open-top microchannel plate structure. This type of microchannel plate has many advantages in electrophoresis. The plate was fabricated by deep X-ray lithography using synchrotron radiation (SR) light and the chemical wet etching process. A deep X-ray exposure mask was fabricated with a silicon on insulator (SOI) substrate. The patterned Si microstructure was micromachined into a thin Si membrane and a thick Au X-ray absorber was embedded in it by electroplating. A plastic material, polymethylmethacrylate (PMMA) was used for the plate substrate. For reduction of the exposure time and high-aspect-ratio fast wet development, the fabrication condition was optimized with respect to not the exposure dose but to the PMMA mean molecular weight (M.W.) changing after deep X-ray exposure as measured by gel permeation chromatography (GPC). Decrement of the PMMA M.W. and increment of the wet developer temperature accelerated the etching rate. Under optimized fabrication conditions, a microchannel with 50 μm width through 1000 μm PMMA plate, with a high aspect ratio over 20, was fabricated. By using a high-aspect-ratio open-top microchannel plate, high fluorescent electrophoresis was performed.
|ジャーナル||Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes|
|出版物ステータス||出版済み - 6 2003|
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)