Fabrication of ultrathin Ni-Zn ferrite films using electron cyclotron resonance sputtering method

Terumitsu Tanaka, Hiroki Kurisu, Mitsuru Matsuura, Yoshihiro Shimosato, Shigenobu Okada, Kazunori Oshiro, Hirotaka Fujimori, Setsuo Yamamoto

研究成果: Contribution to journalArticle査読

10 被引用数 (Scopus)

抄録

Well-crystallized Ni-Zn ferrite (Ni0.4 Zn0.6 Fe2 O4) highly oriented ultrathin films were obtained at a substrate temperature of 200 °C by a reactive sputtering method utilizing electron cyclotron resonance microwave plasma, which is very effective to crystallize oxide or nitride materials without heat treatment. Thin films of Ni-Zn ferrite deposited on a MgO (100) underlayer showed an intense X-ray-diffraction peak of (400) from the Ni-Zn ferrite as compared to similar films deposited directly onto thermally oxidized Si substrates. A 1.5-nm-thick Ni-Zn ferrite film, which corresponds to twice the lattice constant for bulk Ni-Zn ferrite, crystallized on a MgO (100) underlayer.

本文言語英語
論文番号08N507
ジャーナルJournal of Applied Physics
99
8
DOI
出版ステータス出版済み - 2006
外部発表はい

All Science Journal Classification (ASJC) codes

  • 物理学および天文学(全般)

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