Facile and scalable patterning of sublithographic scale uniform nanowires by ultra-thin AAO free-standing membrane

Gang Meng, Takeshi Yanagida, Kazuki Nagashima, Takashi Yanagishita, Masaki Kanai, Keisuke Oka, Annop Klamchuen, Sakon Rahong, Mati Horprathum, Bo Xu, Fuwei Zhuge, Yong He, Hideki Masuda, Tomoji Kawai

研究成果: Contribution to journalArticle査読

18 被引用数 (Scopus)

抄録

Creating sublithographic scale uniform nanowires for large area is an important issue for nanowire-based various device applications. Although anodic aluminium oxide (AAO) membrane is a promising technique, existing attached AAO membrane mask methods have not been able to fabricate such small nanowires for large areas due to difficulties on transferring a thin membrane. Here we demonstrate a facile and scalable methodology to fabricate sublithographic scale uniform-sized nanowires by introducing ultra-thin AAO free-standing membrane with a rigid Al frame and a hydrophilic contacting method. The present method allows us to fabricate sub 20 nm nanowires with the standard deviations of 1.1 nm via defining the size and spacing of metal catalysts for nanowire growth. We also show the scalability of the present attached AAO membrane mask method for a 4-inch scale wafer.

本文言語英語
ページ(範囲)10618-10623
ページ数6
ジャーナルRSC Advances
2
28
DOI
出版ステータス出版済み - 11 14 2012

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Chemical Engineering(all)

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