Focused ion beam fabrication of novel core-shell nanowire structures

Li He, Jonas Johansson, Mitsuhiro Murayama, Robert Hull

研究成果: Contribution to journalArticle査読

4 被引用数 (Scopus)

抄録

A novel method of indirect deposition by means of a focused ion beam (FIB) is utilized to develop metal/insulator/semiconductor nanowire core-shell structures. This method is based upon depositing an annular pattern centered on a nanowire, with secondary deposition then coating the wire. Typical cross-sectional deposition area increments as a function of ion doses are 1.3 × 10-2 μm2 nC-1 for Pt and 3.5 × 10-2 μm2 nC-1 for SiO2. The structures are examined with a transmission electron microscope (TEM) using a new nanowire TEM sample preparation method that allows direct examinations of individually selected core-shell nanowires fabricated under different indirect FIB deposition conditions. Elemental analyses by means of energy dispersive x-ray spectroscopy and electron energy filtered TEM imaging verify the deposition of SiO2 and Pt layers. Relatively uniform Pt and SiO 2 coatings on individual GaP nanowires can be achieved with overall thickness deviation of about 10% for deposition up to 25-30 nm thick Pt or SiO2 shells. It should be possible to extend this approach to any nanowire/nanotube system, and to a wide range of coatings in any desired layer sequences.

本文言語英語
論文番号445610
ジャーナルNanotechnology
19
44
DOI
出版ステータス出版済み - 11 5 2008
外部発表はい

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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