Foreword: Advanced plasma science and its applications for nitride and nanomaterials

Takashi Itoh; Shigeya Naritsuka; Yasufumi Fujiwara; Mineo Hiramatsu; Makoto Kasu; Kazunori Koga; Hiroki Kondo; Koh Matsumoto; Osamu Nakatsuka; Kiichi Niitsu; Tomohiro Nozaki; Takayuki Ohta; Osamu Sakai; Hideki Sato; Tetsuya Takeuchi; Giichiro Uchida

doi:10.7567/JJAP.56.01A001

Foreword: Advanced plasma science and its applications for nitride and nanomaterials

Takashi Itoh, Shigeya Naritsuka, Yasufumi Fujiwara, Mineo Hiramatsu, Makoto Kasu, Kazunori Koga, Hiroki Kondo, Koh Matsumoto, Osamu Nakatsuka, Kiichi Niitsu, Tomohiro Nozaki, Takayuki Ohta, Osamu Sakai, Hideki Sato, Tetsuya Takeuchi, Giichiro Uchida

電子デバイス工学

研究成果: ジャーナルへの寄稿 › 編集 › 査読

本文言語	英語
論文番号	01A001
ジャーナル	Japanese journal of applied physics
巻	56
号	1
DOI	https://doi.org/10.7567/JJAP.56.01A001
出版ステータス	出版済み - 1月 2017

!!!All Science Journal Classification (ASJC) codes

工学（全般）
物理学および天文学（全般）

文献へのアクセス

10.7567/JJAP.56.01A001

他のファイルとリンク

引用スタイル

Itoh, T., Naritsuka, S., Fujiwara, Y., Hiramatsu, M., Kasu, M., Koga, K., Kondo, H., Matsumoto, K., Nakatsuka, O., Niitsu, K., Nozaki, T., Ohta, T., Sakai, O., Sato, H., Takeuchi, T., & Uchida, G. (2017). Foreword: Advanced plasma science and its applications for nitride and nanomaterials. Japanese journal of applied physics, 56(1), [01A001]. https://doi.org/10.7567/JJAP.56.01A001

Itoh, T, Naritsuka, S, Fujiwara, Y, Hiramatsu, M, Kasu, M, Koga, K, Kondo, H, Matsumoto, K, Nakatsuka, O, Niitsu, K, Nozaki, T, Ohta, T, Sakai, O, Sato, H, Takeuchi, T & Uchida, G 2017, 'Foreword: Advanced plasma science and its applications for nitride and nanomaterials', Japanese journal of applied physics, vol. 56, no. 1, 01A001. https://doi.org/10.7567/JJAP.56.01A001

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AU - Kasu, Makoto

AU - Koga, Kazunori

AU - Kondo, Hiroki

AU - Matsumoto, Koh

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AU - Niitsu, Kiichi

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AU - Ohta, Takayuki

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AU - Sato, Hideki

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AU - Uchida, Giichiro

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