Formation mechanism of amorphous silicon nanoparticles with additional counter-flow quenching gas by induction thermal plasma

Xiaoyu Zhang, Zishen Liu, Manabu Tanaka, Takayuki Watanabe

研究成果: Contribution to journalArticle査読

6 被引用数 (Scopus)

抄録

The fabrication process of amorphous silicon nanoparticles by induction thermal plasma was studied by experiments and numerical simulations. Additional quenching gas was introduced as counter-flow to the plasma tail flame to enhance quenching effect. The flow rate of quenching gas ranged from 0 to 70 L/min. Amorphous silicon nanoparticles were confirmed by electronic diffraction analysis with random shapes and serious agglomerate, while the crystal particles had a totally different morphology of spherical and freestanding. The quenching rate was estimated on the basis of numerical results and increased from 3.2 × 104 to 8.9 × 105 K/s with quenching gas flow rate. The amount of amorphous silicon increased as quenching gas injection and should be attributed to the improved preparation of small nanoparticles (<5 nm). The above results suggested the formation of amorphous silicon in thermal plasma is controllable.

本文言語英語
論文番号116217
ジャーナルChemical Engineering Science
230
DOI
出版ステータス出版済み - 2 2 2021

All Science Journal Classification (ASJC) codes

  • 化学 (全般)
  • 化学工学(全般)
  • 産業および生産工学

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