Formation of high-purity organic thin films by gas flow deposition and the effect of impurities on device characteristics

Kohei Tsugita, Tomohiko Edura, Masayuki Yahiro, Chihaya Adachi

研究成果: Contribution to journalArticle査読

9 被引用数 (Scopus)

抄録

A gas flow deposition (GFD) system was developed to manufacture large-scale organic light-emitting diodes (OLEDs). A N,N′-di(1-naphthyl)-N,N′- diphenylbenzidine (α-NPD) thin film with a high purity of 99.97% was obtained using the GFD system. The film properties such as morphology, and electrical and optical characteristics were almost the same as those of films made by conventional vacuum thermal evaporation.

本文言語英語
ページ(範囲)418-422
ページ数5
ジャーナルDisplays
34
5
DOI
出版ステータス出版済み - 2013

All Science Journal Classification (ASJC) codes

  • Human-Computer Interaction
  • Hardware and Architecture
  • Electrical and Electronic Engineering

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