Formation of SiO2 thin films on polycrystalline silicon thin films from polysilazane solution by CO2 laser annealing

Daisuke Hishitani; Masahiro Horita; Yasuaki Ishikawa; Yosuke Watanabe; Hiroshi Ikenoue; Yukiharu Uraoka

Formation of SiO2 thin films on polycrystalline silicon thin films from polysilazane solution by CO2 laser annealing

Daisuke Hishitani, Masahiro Horita, Yasuaki Ishikawa, Yosuke Watanabe, Hiroshi Ikenoue, Yukiharu Uraoka

システム情報科学研究院

研究成果: 書籍/レポートタイプへの寄稿 › 会議への寄与

1 被引用数 (Scopus)

抄録

We investigated the formation of SiO2 thin films on polycrystalline silicon thin films by CO2 laser irradiation of perhydropolysilazane. We succeeded in the formation of SiO2 containing few OH groups and having uniform composition in the thickness direction. We considered the effect of CO2 laser irradiation was related to bond vibration.

本文言語	英語
ホスト出版物のタイトル	20th International Display Workshops 2013, IDW 2013
出版社	International Display Workshops
ページ	419-422
ページ数	4
ISBN（電子版）	9781510827783
出版ステータス	出版済み - 1月 1 2013
イベント	20th International Display Workshops 2013, IDW 2013 - Sapporo, 日本継続期間: 12月 3 2013 → 12月 6 2013

出版物シリーズ

名前	Proceedings of the International Display Workshops
巻	1
ISSN（印刷版）	1883-2490

その他

その他	20th International Display Workshops 2013, IDW 2013
国/地域	日本
City	Sapporo
Period	12/3/13 → 12/6/13

!!!All Science Journal Classification (ASJC) codes

コンピュータビジョンおよびパターン認識
人間とコンピュータの相互作用
電子工学および電気工学
電子材料、光学材料、および磁性材料
放射線学、核医学およびイメージング

UN SDG

この成果は、次の持続可能な開発目標に貢献しています

他のファイルとリンク

引用スタイル

Hishitani, D., Horita, M., Ishikawa, Y., Watanabe, Y., Ikenoue, H., & Uraoka, Y. (2013). Formation of SiO2 thin films on polycrystalline silicon thin films from polysilazane solution by CO2 laser annealing. In 20th International Display Workshops 2013, IDW 2013 (pp. 419-422). (Proceedings of the International Display Workshops; Vol. 1). International Display Workshops.

Formation of SiO2 thin films on polycrystalline silicon thin films from polysilazane solution by CO2 laser annealing. / Hishitani, Daisuke; Horita, Masahiro; Ishikawa, Yasuaki その他.

20th International Display Workshops 2013, IDW 2013. International Display Workshops, 2013. p. 419-422 (Proceedings of the International Display Workshops; Vol. 1).

研究成果: 書籍/レポートタイプへの寄稿 › 会議への寄与

Hishitani, D, Horita, M, Ishikawa, Y, Watanabe, Y, Ikenoue, H & Uraoka, Y 2013, Formation of SiO2 thin films on polycrystalline silicon thin films from polysilazane solution by CO2 laser annealing. in 20th International Display Workshops 2013, IDW 2013. Proceedings of the International Display Workshops, vol. 1, International Display Workshops, pp. 419-422, 20th International Display Workshops 2013, IDW 2013, Sapporo, 日本, 12/3/13.

@inproceedings{e1dff6052cd249bab8eff56f423a87e9,

title = "Formation of SiO2 thin films on polycrystalline silicon thin films from polysilazane solution by CO2 laser annealing",

abstract = "We investigated the formation of SiO2 thin films on polycrystalline silicon thin films by CO2 laser irradiation of perhydropolysilazane. We succeeded in the formation of SiO2 containing few OH groups and having uniform composition in the thickness direction. We considered the effect of CO2 laser irradiation was related to bond vibration.",

author = "Daisuke Hishitani and Masahiro Horita and Yasuaki Ishikawa and Yosuke Watanabe and Hiroshi Ikenoue and Yukiharu Uraoka",

year = "2013",

month = jan,

day = "1",

language = "English",

series = "Proceedings of the International Display Workshops",

publisher = "International Display Workshops",

pages = "419--422",

booktitle = "20th International Display Workshops 2013, IDW 2013",

note = "20th International Display Workshops 2013, IDW 2013 ; Conference date: 03-12-2013 Through 06-12-2013",

}

TY - GEN

T1 - Formation of SiO2 thin films on polycrystalline silicon thin films from polysilazane solution by CO2 laser annealing

AU - Hishitani, Daisuke

AU - Horita, Masahiro

AU - Ishikawa, Yasuaki

AU - Watanabe, Yosuke

AU - Ikenoue, Hiroshi

AU - Uraoka, Yukiharu

PY - 2013/1/1

Y1 - 2013/1/1

N2 - We investigated the formation of SiO2 thin films on polycrystalline silicon thin films by CO2 laser irradiation of perhydropolysilazane. We succeeded in the formation of SiO2 containing few OH groups and having uniform composition in the thickness direction. We considered the effect of CO2 laser irradiation was related to bond vibration.

AB - We investigated the formation of SiO2 thin films on polycrystalline silicon thin films by CO2 laser irradiation of perhydropolysilazane. We succeeded in the formation of SiO2 containing few OH groups and having uniform composition in the thickness direction. We considered the effect of CO2 laser irradiation was related to bond vibration.

UR - http://www.scopus.com/inward/record.url?scp=85026260346&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85026260346&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:85026260346

T3 - Proceedings of the International Display Workshops

SP - 419

EP - 422

BT - 20th International Display Workshops 2013, IDW 2013

PB - International Display Workshops

T2 - 20th International Display Workshops 2013, IDW 2013

Y2 - 3 December 2013 through 6 December 2013

ER -

Formation of SiO2 thin films on polycrystalline silicon thin films from polysilazane solution by CO2 laser annealing

抄録

出版物シリーズ

その他

!!!All Science Journal Classification (ASJC) codes

UN SDG

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