Fragmentation process of size-selected aluminum cluster anions in collision with a silicon surface

Akira Terasaki, Tatsuya Tsukuda, Hisato Yasumatsu, Toshiki Sugai, Tamotsu Kondow

研究成果: Contribution to journalArticle査読

34 被引用数 (Scopus)

抄録

Dynamical processes involved in the collision of aluminum cluster anions, AlN- (4≤N≤25), with a silicon surface were investigated. Intact and fragment cluster anions, Aln- (n≤N), were produced upon the collision. The surface-tangent and surface-normal recoil velocity components of these product anions were determined. The tangential recoil velocities of the fragment cluster anions were considerably slow, ranging from 5% to 30% of the velocity of the incident parent cluster anion, while the normal velocities were conserved relatively well. These results are explained in such a manner that the fragment cluster anion is evaporated from the parent cluster anion while it interacts with the surface and loses its tangential momentum. The dynamics and the energetics derived from these results show further that the fragmentation process involves not only sequential evaporation of aluminum atoms but also simultaneous production of several small fragment clusters. Comparison of the present result with that of the collision-induced dissociation by a rare-gas atom lends a further support on this nonsequential fragmentation mechanism.

本文言語英語
ページ(範囲)1387-1393
ページ数7
ジャーナルJournal of Chemical Physics
104
4
DOI
出版ステータス出版済み - 1 1 1996
外部発表はい

All Science Journal Classification (ASJC) codes

  • 物理学および天文学(全般)
  • 物理化学および理論化学

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