Generation and surface modification of Si nano-particles using SiH 4/H2 and N2 multi-hollow discharges and their application to the third generation photovoltaics

Kazunori Koga, Giichiro Uchida, Kosuke Yamamoto, Munenori Sato, Yuki Kawashima, Kunihiro Kamataki, Naho Itagaki, Masaharu Shiratani

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

抄録

We present production of surface nitridated silicon nano-particle composite films for efficient multi exciton generation. Nitridation of silicon nano-particles were produced using double multi-hollow discharge plasma CVD, where generation of silicon nano-particles and their nitridation were independently performed using SiH4/H2 and N2 multi-hollow discharge plasmas. We succeeded in controlling nitrogen contents in silicon nano-particle composite films by varying flux of N radicals irradiated to silicon particles. We also observed strong photoluminescence emission centered at around 700 nm from the films. The PL signal may be attributed to the recombination of exciton confined in silicon nano-p articles.

本文言語英語
ホスト出版物のタイトルInternational Conference on Advances in Condensed and Nano Materials, ICACNM-2011
ページ27-30
ページ数4
DOI
出版ステータス出版済み - 2011
イベントInternational Conference on Advances in Condensed and Nano Materials, ICACNM-2011 - Chandigarh, インド
継続期間: 2 23 20112 26 2011

出版物シリーズ

名前AIP Conference Proceedings
1393
ISSN(印刷版)0094-243X
ISSN(電子版)1551-7616

その他

その他International Conference on Advances in Condensed and Nano Materials, ICACNM-2011
国/地域インド
CityChandigarh
Period2/23/112/26/11

All Science Journal Classification (ASJC) codes

  • 物理学および天文学(全般)

フィンガープリント

「Generation and surface modification of Si nano-particles using SiH <sub>4</sub>/H<sub>2</sub> and N<sub>2</sub> multi-hollow discharges and their application to the third generation photovoltaics」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

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