Gradient-index microlens formed by ion-beam sputtering

Jun Ichi Shimada, Osamu Ohguchi, Renshi Sawada

研究成果: Contribution to journalArticle

20 被引用数 (Scopus)

抄録

This paper describes the fabrication and characteristics of a gradient-index microlens by using a low-stress, high-transmittance film that is deposited by ion-beam sputtering. The key techniques in forming this film are sputtering with N2 gas, performing ion-beam irradiation during deposition, and stabilizing the deposition acceleration current. An integrated device consisting of the microlens and a laser diode is demonstrated. The focusing spot size is 2 μm x 3 μm at a distemce of 11 μm from the lens facet.

本文言語英語
ページ(範囲)5230-5236
ページ数7
ジャーナルApplied Optics
31
25
DOI
出版ステータス出版済み - 9 1 1992
外部発表はい

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics

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