Growth conditions of buffer layers on textured NiW substrates by pulsed-laser deposition

A. Nakai, J. Matsuda, Y. Sutoh, Y. Kitoh, M. Yoshizumi, T. Izumi, Y. Shiohara, M. Mimura

研究成果: Contribution to journalArticle査読

3 被引用数 (Scopus)

抄録

YBCO coated conductor consists of several layers which have many roles such as Ni diffusion barrier, lattices matching and texturing upper layers. Texturing by the ion-beam assisted deposition method (IBAD) increases the total cost significantly, therefore, textured NiW substrates are expected to be used in the near future because of its low cost. However, an appropriate architecture and/or conditions to deposit buffer layers and the YBCO layer on textured NiW substrates are different from those on IBAD substrates. Growth conditions of the buffer layers on textured NiW substrates were studied in this work by using pulsed-laser deposition (PLD) or electron beam evaporation (E-Beam). Several oxide buffer layers are used for making coated conductors. Since the grain size of NiW is large and its surface is oxidized easily, we investigated the influence of growth conditions of the seed layers on upper layers. Many parameters affect the degree of in-plane grain alignment (Δφ{symbol}), for example, distance between the target and the substrate. Δφ{symbol} value of CeO2 seed layers on NiW deposited by PLD were not improved although those deposited by E-Beam were improved. YBCO films were deposited on the buffer layers by metal organic deposition using trifluoroacetates (TFA-MOD) and its critical current (Ic) of 310 A/cm at 77 K, 0 T was obtained on Δφ{symbol} of 5.4° of the CeO2 seed layer.

本文言語英語
ページ(範囲)615-618
ページ数4
ジャーナルPhysica C: Superconductivity and its applications
463-465
SUPPL.
DOI
出版ステータス出版済み - 10 1 2007
外部発表はい

All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • エネルギー工学および電力技術
  • 電子工学および電気工学

フィンガープリント

「Growth conditions of buffer layers on textured NiW substrates by pulsed-laser deposition」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル