Growth kinetics and behavior of dust particles in silane plasmas

研究成果: Contribution to journalArticle査読

36 被引用数 (Scopus)

抄録

Growth kinetics and behavior of dust particles in silane plasmas are studied using a new method combining an rf discharge modulation technique with two laser light scattering techniques. From the experiments, the following results are obtained: dust particles tend to be sustained around plasma/sheath boundaries near electrodes, especially the rf electrode; dust particles of a larger size exist in a lower space potential region near the rf electrode; dust size and density amount to 60-180 nm and 108-109cm-3in 1-2 s after the rf-power-on. The dust growth rate, which is high compared to the film deposition rate, can be explained by taking into account the contribution of positive-ion and/or neutral radical fluxes. The dust-trapping around the boundary can be explained by the balance between the electrostatic force and the ion drag force exerting on the particle. The effects of gas flow on dust motion and a dust suppression mechanism for rf modulated discharges are also discussed.

本文言語英語
ページ(範囲)3074-3080
ページ数7
ジャーナルJapanese Journal of Applied Physics
32
6 S
DOI
出版ステータス出版済み - 6 1993

All Science Journal Classification (ASJC) codes

  • 工学(全般)
  • 物理学および天文学(全般)

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