Guest Editorial Introduction to the Special Issue on the 10                         th                          Asia-Pacific Symposium on Plasma Technology (APSPT 2017)

Cheng Che Hsu; Ta Chin Wei; Ying Hao Liao; Yasunori Tanaka; Kungen Teii

doi:10.1109/TPS.2019.2892793

Guest Editorial Introduction to the Special Issue on the 10 ^th Asia-Pacific Symposium on Plasma Technology (APSPT 2017)

Cheng Che Hsu, Ta Chin Wei, Ying Hao Liao, Yasunori Tanaka, Kungen Teii

電気理工学

研究成果: ジャーナルへの寄稿 › 編集 › 査読

本文言語	英語
論文番号	8635419
ページ（範囲）	1034-1035
ページ数	2
ジャーナル	IEEE Transactions on Plasma Science
巻	47
号	2
DOI	https://doi.org/10.1109/TPS.2019.2892793
出版ステータス	出版済み - 2月 2019

!!!All Science Journal Classification (ASJC) codes

核物理学および高エネルギー物理学
凝縮系物理学

文献へのアクセス

10.1109/TPS.2019.2892793

他のファイルとリンク

引用スタイル

Hsu, C. C., Wei, T. C., Liao, Y. H., Tanaka, Y., & Teii, K. (2019). Guest Editorial Introduction to the Special Issue on the 10 ^th Asia-Pacific Symposium on Plasma Technology (APSPT 2017) IEEE Transactions on Plasma Science, 47(2), 1034-1035. [8635419]. https://doi.org/10.1109/TPS.2019.2892793

Guest Editorial Introduction to the Special Issue on the 10 ^th Asia-Pacific Symposium on Plasma Technology (APSPT 2017) . / Hsu, Cheng Che; Wei, Ta Chin; Liao, Ying Hao その他.

In: IEEE Transactions on Plasma Science, Vol. 47, No. 2, 8635419, 02.2019, p. 1034-1035.

研究成果: ジャーナルへの寄稿 › 編集 › 査読

Hsu, CC, Wei, TC, Liao, YH, Tanaka, Y & Teii, K 2019, ' Guest Editorial Introduction to the Special Issue on the 10 ^th Asia-Pacific Symposium on Plasma Technology (APSPT 2017) ', IEEE Transactions on Plasma Science, vol. 47, no. 2, 8635419, pp. 1034-1035. https://doi.org/10.1109/TPS.2019.2892793

Hsu CC, Wei TC, Liao YH, Tanaka Y, Teii K. Guest Editorial Introduction to the Special Issue on the 10 ^th Asia-Pacific Symposium on Plasma Technology (APSPT 2017) IEEE Transactions on Plasma Science. 2019 2月;47(2):1034-1035. 8635419. https://doi.org/10.1109/TPS.2019.2892793

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